SCHEMBL2113845

SCHEMBL2113845

CC(C)(O)C#Cc1[c]cccc1

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.34
ASIC3 Q9UHC3 1/20 0.32
HTT P42858 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2116544 0.82 MAPT (0.37) MAPT
SCHEMBL2116025 0.80
SCHEMBL483062 0.73
SCHEMBL1201272 0.70 ASIC3 (0.33) L3MBTL1ASIC3HTT
SCHEMBL2649459 0.69 ALDH1A1 (0.36) L3MBTL1
SCHEMBL16289085 0.69
SCHEMBL4794388 0.69
SCHEMBL487465 0.69 MAPT (0.56) L3MBTL1ASIC3HTTMAPT
SCHEMBL483300 0.68 KDM4E (0.34)
SCHEMBL22759 0.68 KDM4E (0.32) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2555053-B1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2017-10-18 EP disclosed
US-8158324-B2 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2012-04-17 US disclosed
US-20100099041-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2010-04-22 US disclosed