⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2115592 | 0.92 | — | — | |
| SCHEMBL2114831 | 0.86 | — | — | |
| SCHEMBL705612 | 0.86 | — | — | |
| SCHEMBL930258 | 0.86 | — | — | |
| SCHEMBL127299 | 0.86 | — | — | |
| SCHEMBL3293725 | 0.85 | ADRB2 (0.35) | — | |
| Butane SCHEMBL3380761 | 0.83 | — | — | |
| SCHEMBL10887826 | 0.83 | — | — | |
| SCHEMBL2494172 | 0.83 | — | — | |
| SCHEMBL931813 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3956376-A1 | STABLE SILANE MODIFIED POLYMER COMPOSITION AND METHOD | Momentive Performance Materials Inc. (US) | 2022-02-23 | — | — | EP | claimed |
| CN-112126066-A | Preparation method of polycarbosilane with high silicon-hydrogen content | 宁波曙翔新材料股份有限公司 | 2020-12-25 | — | — | CN | claimed |
| CN-111925386-B | Preparation method of novel silicon carbide ceramic precursor | 长沙科航特种织造有限公司 | 2020-12-22 | — | — | CN | claimed |
| WO-2020214935-A1 | STABILE SILANE MODIFIED POLYMER COMPOSITION AND METHOD | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2020-10-22 | — | — | WO | claimed |
| CN-116075368-B | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| CN-116075368-A | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2023-05-05 | — | — | CN | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| CN-110249004-B | Polyimide precursor composition | 东京应化工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| US-6509279-B2 | Methods for processing a coating film and for manufacturing a semiconductor element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-01-21 | — | — | US | disclosed |
| US-20020192981-A1 | Coating liquid for forming a silica group coating film having a small dielectric constant | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020192977-A1 | Mothods for processing a coating film and for manufacturing a semiconductor element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020164886-A1 | Method for processing coating film and method for manufacturing semiconductor element with use of the same method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-07 | — | — | US | disclosed |
| EP-1255289-A2 | Method for processing a coating film and method for manufacturing a semiconductor element with use of the same method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-06 | — | — | EP | disclosed |
| US-20020009791-A1 | Methods for processing a coating film and for manufacturing a semiconductor element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20010038884-A1 | Method for forming coating film on a plate-like workpiece | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |