SCHEMBL4612833

SCHEMBL4612833

CCCO[Si](OCCC)(OCCC)[Si](OCC)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2114336 0.90 CA1 (0.30)
SCHEMBL646648 0.83 CA1 (0.30)
SCHEMBL10887830 0.80
SCHEMBL9357445 0.79 ADRB2 (0.41)
SCHEMBL1608777 0.75
SCHEMBL766415 0.75
SCHEMBL20703882 0.75
SCHEMBL20703800 0.75
SCHEMBL8086469 0.75
SCHEMBL28578700 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1463772-B1 POLYSILOXANE SOLS, METHOD FOR THE PRODUCTION AND USE THEREOF BASF COATINGS AG (DE) 2008-03-05 EP disclosed
US-7239018-B2 Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-07-03 US disclosed
EP-1463772-A1 POLYSILOXANE SOLS, METHOD FOR THE PRODUCTION AND USE THEREOF BASF Coatings AG (DE) 2004-10-06 EP disclosed
US-20040180554-A1 Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-16 US disclosed
WO-2003057761-A1 POLYSILOXANE SOLS, METHOD FOR THE PRODUCTION AND USE THEREOF BASF COATINGS AG (DE) 2003-07-17 WO disclosed