SCHEMBL21147248

SCHEMBL21147248

CC(C)C(=O)OC1C2CC3COC1C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15426672 0.78 BCHE (0.35)
SCHEMBL17322694 0.78
SCHEMBL10064066 0.77 ALDH1A1 (0.38)
SCHEMBL14602017 0.76
SCHEMBL14602124 0.73
SCHEMBL15084174 0.72
SCHEMBL9925266 0.72
SCHEMBL9925263 0.72
SCHEMBL25129600 0.71
SCHEMBL13498198 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3508917-A1 ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD FUJIFILM Corporation (JP) 2019-07-10 EP disclosed