Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | LTA4H | P09960 | 5/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HTR1D | P28221 | 1/20 | 0.32 |
| ▸ | HTR1B | P28222 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | BAX | Q07812 | 1/20 | 0.32 |
| ▸ | MAOA | P21397 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7058914 | 0.95 | CA4 (0.50) | CA4LTA4HTSHRKCNA3TRPA1 | |
| SCHEMBL275159 | 0.83 | LTA4H (0.50) | CA4LTA4HTSHRKCNA3CA5A | |
| SCHEMBL19926950 | 0.83 | LTA4H (0.39) | CA4LTA4HTSHRKCNA3MAOB | |
| SCHEMBL4427583 | 0.80 | CA4 (0.46) | CA4LTA4HTSHRKCNA3TRPA1 | |
| SCHEMBL1609075 | 0.77 | CA4 (0.48) | CA4LTA4HTSHRKCNA3TRPA1 | |
| SCHEMBL27704021 | 0.74 | CA4 (0.50) | CA4LTA4HTSHRKCNA3TRPA1 | |
| SCHEMBL7698665 | 0.74 | LTA4H (0.41) | CA4LTA4HTSHRKCNA3CA5A | |
| SCHEMBL1609017 | 0.73 | LTA4H (0.43) | CA4LTA4HTSHRKCNA3LMNA | |
| SCHEMBL3297484 | 0.73 | CA4 (0.44) | CA4LTA4HTSHRKCNA3TRPA1 | |
| SCHEMBL2114550 | 0.73 | LTA4H (0.43) | CA4LTA4HTSHRKCNA3LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| CN-116075368-A | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2023-05-05 | — | — | CN | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| CN-110249004-B | Polyimide precursor composition | 东京应化工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| CN-108389512-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| EP-1236731-B1 | Method and apparatus for forming a carbon-silicon bond in a silane | GEN ELECTRIC (US) | 2004-05-06 | — | — | EP | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-6489501-B2 | REACTING A TRANSITION METAL HYDRIDE WITH A STARTING SILANE SUCH AS TETRAPHENOXYSILANE IN A PRESENCE OF A CATALYST; AVOIDS USING THE COSTLY ENERGY CONSUMING REDUCTION OF SILICON DIOXIDE TO ELEMENTAL SILICON | GENERAL ELECTRIC COMPANY | 2002-12-03 | — | — | US | disclosed |
| US-20020161254-A1 | METHOD AND APPARATUS FOR FORMING A CARBON-SILICON BOND IN A SILANE | GENERAL ELECTRIC COMPANY | 2002-10-31 | — | — | US | disclosed |
| EP-1236731-A1 | Method and apparatus for forming a carbon-silicon bond in a silane | GENERAL ELECTRIC COMPANY (US) | 2002-09-04 | — | — | EP | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-0693513-B1 | Process for purifying a polyether | ASAHI GLASS CO LTD (JP) | 2001-01-10 | — | — | EP | disclosed |
| US-5973096-A | A CURABLE POLYETHER CONTAINING A HYDROLYZABLE AND SILICON GROUPS WITH IONIC IMPURITIES | ASAHI GLASS COMPANY LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| US-5811566-A | TREATING POLYETHER HAVING UNSATURATED END GROUPS WITH AN ACID WHICH WILL REACT WITH SALT IMPURITIES, ADDING WATER, SURFACTANT AND ADSORBER, FILTRATION, FOR REMOVING CATALYST RESIDUES | ASAHI GLASS COMPANY LTD. (JP) | 1998-09-22 | — | — | US | disclosed |
| EP-0693513-A2 | Process for purifying a polyether | ASAHI GLASS COMPANY LTD. (JP) | 1996-01-24 | — | — | EP | disclosed |