SCHEMBL4427583

SCHEMBL4427583

COO[SiH](Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 2/20 0.46
LTA4H P09960 5/20 0.39
TSHR P16473 1/20 0.38
KCNA3 P22001 1/20 0.32
MAOB P27338 2/20 0.31
TRPA1 O75762 1/20 0.31
CA5A P35218 1/20 0.31
CA5B Q9Y2D0 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
LMNA P02545 1/20 0.30
HTR1D P28221 1/20 0.30
HTR1B P28222 1/20 0.30
NR1H2 P55055 1/20 0.30
BAX Q07812 1/20 0.30
MAOA P21397 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7058914 0.80 CA4 (0.50) CA4LTA4HTSHRKCNA3MAOB
SCHEMBL2115686 0.80 CA4 (0.50) CA4LTA4HTSHRKCNA3MAOB
SCHEMBL275159 0.79 LTA4H (0.50) CA4LTA4HTSHRKCNA3MAOB
SCHEMBL27704021 0.70 CA4 (0.50) CA4LTA4HTSHRKCNA3MAOB
SCHEMBL7698665 0.70 LTA4H (0.41) CA4LTA4HTSHRKCNA3CA5A
SCHEMBL19926950 0.70 LTA4H (0.39) CA4LTA4HTSHRKCNA3MAOB
SCHEMBL1609542 0.70 CA4 (0.39) CA4LTA4HTSHRKCNA3LMNA
SCHEMBL2114550 0.70 LTA4H (0.43) CA4LTA4HTSHRKCNA3LMNA
SCHEMBL1609017 0.70 LTA4H (0.43) CA4LTA4HTSHRKCNA3LMNA
SCHEMBL7694976 0.69 LTA4H (0.45) CA4LTA4HTSHRKCNA3MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022054912-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE 三菱ケミカル株式会社 2022-03-17 WO disclosed
WO-2020235325-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER 東京応化工業株式会社 (JP) 2020-11-26 WO disclosed
WO-2020230828-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER 東京応化工業株式会社 2020-11-19 WO disclosed
EP-2129733-A2 ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER AZ Electronic Materials USA Corp. (US) 2009-12-09 EP disclosed
WO-2008102259-A2 ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-28 WO disclosed
EP-1236731-B1 Method and apparatus for forming a carbon-silicon bond in a silane GEN ELECTRIC (US) 2004-05-06 EP disclosed
US-6489501-B2 REACTING A TRANSITION METAL HYDRIDE WITH A STARTING SILANE SUCH AS TETRAPHENOXYSILANE IN A PRESENCE OF A CATALYST; AVOIDS USING THE COSTLY ENERGY CONSUMING REDUCTION OF SILICON DIOXIDE TO ELEMENTAL SILICON GENERAL ELECTRIC COMPANY 2002-12-03 US disclosed
US-20020161254-A1 METHOD AND APPARATUS FOR FORMING A CARBON-SILICON BOND IN A SILANE GENERAL ELECTRIC COMPANY 2002-10-31 US disclosed
EP-1236731-A1 Method and apparatus for forming a carbon-silicon bond in a silane GENERAL ELECTRIC COMPANY (US) 2002-09-04 EP disclosed