SCHEMBL21170290

SCHEMBL21170290

C=C(C)C(=O)OC1CC2CC=Cc3cccc1c32

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21235005 1.00
SCHEMBL20306557 0.81 MAPT (0.30)
SCHEMBL6642001 0.72 GPX4 (0.31)
SCHEMBL19050221 0.71 POLB (0.38)
SCHEMBL9610386 0.70 NOTUM (0.40)
SCHEMBL9610394 0.69 SLC6A2 (0.36)
SCHEMBL9610479 0.68 RET (0.42)
SCHEMBL9610379 0.67 POLB (0.34)
SCHEMBL9610388 0.67 POLB (0.34)
SCHEMBL11359164 0.66 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
EP-3521926-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2021-04-21 EP disclosed
US-20190219921-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-07-18 US disclosed