⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21170290 | 1.00 | — | — | |
| SCHEMBL20306557 | 0.81 | MAPT (0.30) | — | |
| SCHEMBL6642001 | 0.72 | GPX4 (0.31) | — | |
| SCHEMBL19050221 | 0.71 | POLB (0.38) | — | |
| SCHEMBL9610386 | 0.70 | NOTUM (0.40) | — | |
| SCHEMBL9610394 | 0.69 | SLC6A2 (0.36) | — | |
| SCHEMBL9610479 | 0.68 | RET (0.42) | — | |
| SCHEMBL9610379 | 0.67 | POLB (0.34) | — | |
| SCHEMBL9610388 | 0.67 | POLB (0.34) | — | |
| SCHEMBL11359164 | 0.66 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3521926-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2019-08-07 | — | — | EP | disclosed |