SCHEMBL21189633

SCHEMBL21189633

CC(c1ccc(-c2ccc(C(C)(c3ccc(S)c(-c4ccccc4)c3)c3ccc(S)c(-c4ccccc4)c3)cc2)cc1)(c1ccc(S)c(-c2ccccc2)c1)c1ccc(S)c(-c2ccccc2)c1

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.42
ESR1 P03372 2/20 0.42
ESR2 Q92731 2/20 0.42
BACE1 P56817 1/20 0.37
SGK1 O00141 1/20 0.36
CYP2C9 P11712 1/20 0.34
PTGDR2 Q9Y5Y4 1/20 0.33
AKT1 P31749 1/20 0.33
AKT2 P31751 1/20 0.33
PTPN5 P54829 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189522 1.00 KIF11 (0.42) KIF11ESR1ESR2BACE1SGK1
SCHEMBL21189810 0.96 ESR1 (0.44) KIF11ESR1ESR2BACE1SGK1
SCHEMBL21189626 0.95 ESR1 (0.47) KIF11ESR1ESR2BACE1PTGDR2
SCHEMBL22737577 0.92 ESR2 (0.44) KIF11ESR1ESR2BACE1SGK1
SCHEMBL22738068 0.92 ESR2 (0.44) KIF11ESR1ESR2BACE1SGK1
SCHEMBL22991636 0.90 ESR1 (0.44) KIF11ESR1ESR2BACE1
SCHEMBL21189635 0.90 ESR1 (0.40) KIF11ESR1ESR2BACE1SGK1
SCHEMBL22738052 0.89 ESR2 (0.46) KIF11ESR1ESR2BACE1PTGDR2
SCHEMBL21189630 0.86 NPC1 (0.40) KIF11ESR1ESR2
SCHEMBL22991295 0.84 ALDH1A1 (0.47) KIF11BACE1PTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed