SCHEMBL21189626

SCHEMBL21189626

CC(c1ccccc1)(c1ccc(S)c(-c2ccccc2)c1)c1ccc(S)c(-c2ccccc2)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.47
ESR2 Q92731 3/20 0.47
CNR1 P21554 2/20 0.36
CNR2 P34972 2/20 0.36
KIF11 P52732 1/20 0.35
BACE1 P56817 2/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.34
ALDH1A1 P00352 2/20 0.33
CYP3A4 P08684 1/20 0.33
NPC1 O15118 1/20 0.33
PLA2G1B P04054 1/20 0.33
NFKB1 P19838 1/20 0.33
CASP3 P42574 1/20 0.33
RAB9A P51151 1/20 0.33
NFKB2 Q00653 1/20 0.33
RELA Q04206 1/20 0.33
SENP8 Q96LD8 1/20 0.33
SENP7 Q9BQF6 1/20 0.33
SENP6 Q9GZR1 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189810 0.98 ESR1 (0.44) ESR1ESR2CNR1CNR2KIF11
SCHEMBL21189633 0.95 KIF11 (0.42) ESR1ESR2KIF11BACE1PTGDR2
SCHEMBL21189522 0.95 KIF11 (0.42) ESR1ESR2KIF11BACE1PTGDR2
SCHEMBL22991636 0.92 ESR1 (0.44) ESR1ESR2CNR1CNR2KIF11
SCHEMBL22738052 0.90 ESR2 (0.46) ESR1ESR2CNR1CNR2KIF11
SCHEMBL22737577 0.88 ESR2 (0.44) ESR1ESR2CNR1CNR2KIF11
SCHEMBL22738068 0.88 ESR2 (0.44) ESR1ESR2CNR1CNR2KIF11
SCHEMBL21189680 0.87 CYP3A4 (0.36) ESR1ESR2CYP3A4MAPK1
SCHEMBL21189674 0.86 ESR1 (0.47) ESR1ESR2CNR1CNR2ALDH1A1
SCHEMBL22991295 0.85 ALDH1A1 (0.47) KIF11BACE1PTGDR2ALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed