SCHEMBL21189651

SCHEMBL21189651

CC(c1ccccc1)(c1ccccc1S)c1ccccc1S

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.45
ESR2 Q92731 3/20 0.45
MAPK1 P28482 1/20 0.39
ALDH1A1 P00352 4/20 0.39
TSHR P16473 3/20 0.39
TAAR1 Q96RJ0 1/20 0.37
ALOX15 P16050 1/20 0.37
CYP2B6 P20813 1/20 0.36
CYP3A4 P08684 1/20 0.35
KCNN4 O15554 4/20 0.34
MAPT P10636 1/20 0.34
KMT2A Q03164 1/20 0.34
CRHBP P24387 1/20 0.34
CRHR2 Q13324 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189661 0.93 ESR1 (0.41) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL21189660 0.88 KIF11 (0.47) ESR1ESR2ALDH1A1CYP3A4
SCHEMBL21189569 0.85 ESR1 (0.41) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL22738140 0.84 ESR1 (0.38) ESR1ESR2TSHR
SCHEMBL15105375 0.82 ALDH1A1 (0.45) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL21189657 0.79 ESR1 (0.39) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL22737598 0.79 ESR1 (0.39) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL22991407 0.77 ESR1 (0.41) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL21189652 0.77 ESR2 (0.55) ESR1ESR2MAPK1ALDH1A1TSHR
SCHEMBL21189687 0.76 TSHR (0.42) MAPK1ALDH1A1TSHRTAAR1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed