SCHEMBL21189660

SCHEMBL21189660

CC(c1ccc(-c2ccccc2)cc1)(c1ccccc1S)c1ccccc1S

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 2/20 0.47
CYP2C9 P11712 1/20 0.41
ESR1 P03372 2/20 0.39
ESR2 Q92731 2/20 0.39
PTPN5 P54829 1/20 0.35
AKT1 P31749 1/20 0.35
AKT2 P31751 1/20 0.35
ALDH1A1 P00352 1/20 0.35
CYP17A1 P05093 1/20 0.33
CYP3A4 P08684 1/20 0.33
BACE1 P56817 1/20 0.33
CYP19A1 P11511 1/20 0.33
MME P08473 1/20 0.33
ACE P12821 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189661 0.90 ESR1 (0.41) KIF11ESR1ESR2ALDH1A1CYP3A4
SCHEMBL21189651 0.88 ESR1 (0.45) ESR1ESR2ALDH1A1CYP3A4
SCHEMBL21189658 0.82 KIF11 (0.41) KIF11CYP2C9ESR1ESR2PTPN5
SCHEMBL22737749 0.81 KIF11 (0.40) KIF11CYP2C9ESR1ESR2PTPN5
SCHEMBL21189631 0.81 KIF11 (0.40) KIF11CYP2C9ESR1ESR2PTPN5
SCHEMBL22738140 0.81 ESR1 (0.38) ESR1ESR2
SCHEMBL22991387 0.81 KIF11 (0.33) KIF11ESR1ESR2
SCHEMBL21189659 0.78 ESR1 (0.48) KIF11CYP2C9ESR1ESR2PTPN5
SCHEMBL23861532 0.77 ALDH1A1 (0.52) KIF11CYP2C9ESR1ESR2PTPN5
SCHEMBL21189809 0.75 ESR1 (0.35) KIF11CYP2C9ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed