SCHEMBL21189662

SCHEMBL21189662

CC(c1ccc(S)cc1)(c1ccc(S)cc1)c1ccc(C(C)(c2ccc(S)cc2)c2ccc(S)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.44
ESR2 Q92731 3/20 0.44
IDO1 P14902 1/20 0.38
CYP19A1 P11511 2/20 0.38
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
TSHR P16473 2/20 0.35
LMNA P02545 1/20 0.33
TYR P14679 1/20 0.33
CYP3A4 P08684 1/20 0.33
AR P10275 1/20 0.33
HPGD P15428 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
HTR6 P50406 1/20 0.33
ESRRG P62508 1/20 0.33
SLC6A3 Q01959 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22738141 0.89 TSHR (0.52) ESR1ESR2IDO1CYP19A1MEN1
SCHEMBL21189655 0.89 ESR1 (0.60) ESR1ESR2CYP19A1KMT2ATSHR
SCHEMBL21189659 0.83 ESR1 (0.48) ESR1ESR2CYP3A4HSD17B10
SCHEMBL67741 0.81 TSHR (0.55) IDO1TSHRLMNATYRHPGD
SCHEMBL635574 0.81 ESR1 (0.52) ESR1ESR2IDO1MEN1KMT2A
SCHEMBL21189664 0.81 IDO1 (0.38) ESR1ESR2IDO1MEN1KMT2A
SCHEMBL6524730 0.79 TSHR (0.52) IDO1TSHRLMNATYRHPGD
SCHEMBL6516058 0.79 TSHR (0.52) IDO1TSHRLMNATYRHPGD
Iodide SCHEMBL217484 0.79 TSHR (0.52) IDO1TSHRLMNATYRHPGD
SCHEMBL22737750 0.77 ESR1 (0.42) ESR1ESR2MEN1KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed