SCHEMBL21189679

SCHEMBL21189679

CC(c1ccc(S)c(-c2ccccc2S)c1)(c1ccc(S)c(-c2ccccc2S)c1)c1ccc2ccccc2c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
CASP3 P42574 2/20 0.38
SENP8 Q96LD8 2/20 0.38
SENP7 Q9BQF6 2/20 0.38
SENP6 Q9GZR1 2/20 0.38
ALDH1A1 P00352 1/20 0.38
PLA2G1B P04054 1/20 0.38
NFKB1 P19838 1/20 0.38
NFKB2 Q00653 1/20 0.38
RELA Q04206 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
ATG4B Q9Y4P1 1/20 0.38
CYP3A4 P08684 2/20 0.37
CYP2D6 P10635 2/20 0.37
SLC6A2 P23975 2/20 0.37
SLC6A4 P31645 2/20 0.37
SLC6A3 Q01959 2/20 0.37
KCNH2 Q12809 2/20 0.37
PTPN1 P18031 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22737890 0.94 ESR1 (0.36) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189811 0.88 NPC1 (0.43) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189680 0.86 CYP3A4 (0.36) CYP3A4CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL21189674 0.85 ESR1 (0.47) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189630 0.83 NPC1 (0.40) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189816 0.81 ALDH1A1 (0.33) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189635 0.81 ESR1 (0.40) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL21189815 0.80 NPC1 (0.40) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL22738047 0.78 ESR1 (0.41) NPC1RAB9ACASP3SENP8SENP7
SCHEMBL22991389 0.77 NPC1 (0.38) NPC1RAB9ACASP3SENP8SENP7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed