SCHEMBL21189680

SCHEMBL21189680

CC(c1ccc(S)c(-c2ccccc2)c1)(c1ccc(S)c(-c2ccccc2)c1)c1ccc2ccccc2c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
SLC6A3 Q01959 1/20 0.36
KCNH2 Q12809 1/20 0.36
ESR1 P03372 3/20 0.36
ESR2 Q92731 2/20 0.36
SGK1 O00141 1/20 0.36
PTPN1 P18031 1/20 0.35
CYP1A2 P05177 1/20 0.34
CYP2A6 P11509 1/20 0.34
PTGS2 P35354 1/20 0.34
CASR P41180 1/20 0.34
ADORA2A P29274 1/20 0.33
ADORA1 P30542 1/20 0.33
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
MAPK1 P28482 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189810 0.89 ESR1 (0.44) ESR1ESR2SGK1
SCHEMBL21189626 0.87 ESR1 (0.47) CYP3A4ESR1ESR2MAPK1
SCHEMBL21189679 0.86 NPC1 (0.38) CYP3A4CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL21189522 0.85 KIF11 (0.42) ESR1ESR2SGK1
SCHEMBL21189633 0.85 KIF11 (0.42) ESR1ESR2SGK1
SCHEMBL21189818 0.81 HPGD (0.33) CYP2D6CYP1A2MEN1MAPTKMT2A
SCHEMBL22738052 0.81 ESR2 (0.46) ESR1ESR2CYP2A6ADORA2AADORA1
SCHEMBL23861507 0.81 ESR1 (0.50) CYP3A4CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL22991293 0.80 CNR1 (0.44) CYP3A4ESR1ESR2
SCHEMBL22991295 0.80 ALDH1A1 (0.47) CYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed