SCHEMBL21189674

SCHEMBL21189674

CC(c1ccccc1)(c1ccc(S)c(-c2ccccc2S)c1)c1ccc(S)c(-c2ccccc2S)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.47
ESR2 Q92731 3/20 0.47
ALDH1A1 P00352 5/20 0.41
NPC1 O15118 2/20 0.41
CASP3 P42574 2/20 0.41
RAB9A P51151 2/20 0.41
SENP8 Q96LD8 2/20 0.41
SENP7 Q9BQF6 2/20 0.41
SENP6 Q9GZR1 2/20 0.41
PLA2G1B P04054 1/20 0.41
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ATG4B Q9Y4P1 1/20 0.41
MAPK1 P28482 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
LMNA P02545 1/20 0.37
ATM Q13315 1/20 0.37
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189811 0.96 NPC1 (0.43) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189635 0.92 ESR1 (0.40) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189630 0.91 NPC1 (0.40) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189626 0.86 ESR1 (0.47) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL22738047 0.85 ESR1 (0.41) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL22737893 0.85 ESR1 (0.42) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189679 0.85 NPC1 (0.38) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189815 0.84 NPC1 (0.40) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189810 0.84 ESR1 (0.44) ESR1ESR2ALDH1A1NPC1CASP3
SCHEMBL21189639 0.81 ALDH1A1 (0.39) ALDH1A1NPC1CASP3RAB9ASENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed