SCHEMBL21189703

SCHEMBL21189703

CC(c1ccc(S)cc1)(c1ccc(S)cc1)C1CCCCC1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 2/20 0.33
RAB9A P51151 2/20 0.32
ALDH1A1 P00352 1/20 0.32
HPGD P15428 1/20 0.32
EPHX1 P07099 1/20 0.32
EPHX2 P34913 1/20 0.32
CYP2D6 P10635 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C19 P33261 1/20 0.31
NPY1R P25929 1/20 0.31
NPY2R P49146 1/20 0.31
NPY4R P50391 1/20 0.31
NPY5R Q15761 1/20 0.31
KEAP1 Q14145 1/20 0.31
NFE2L2 Q16236 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ALOX5AP P20292 2/20 0.30
SLC6A2 P23975 1/20 0.30
CHRM2 P08172 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5469803 0.80 ESR1 (0.46) CYP19A1RAB9AALDH1A1HPGDEPHX1
SCHEMBL5461605 0.78 ESR2 (0.48) RAB9AALDH1A1HPGDMEN1KMT2A
SCHEMBL21189702 0.76
SCHEMBL8162679 0.72 ALDH1A1 (0.56) CYP19A1RAB9AALDH1A1HPGDNPY1R
SCHEMBL21189421 0.72 CYP3A4 (0.41) ALDH1A1KMT2AKCNH2
SCHEMBL21189700 0.71 CHRM2 (0.36) ALDH1A1CYP2D6KEAP1NFE2L2MEN1
SCHEMBL22737913 0.70 TP53 (0.30) RAB9AKMT2A
SCHEMBL6387270 0.65 TSHR (0.44) CYP19A1RAB9AALDH1A1HPGDEPHX1
SCHEMBL21189662 0.65 ESR1 (0.44) CYP19A1HPGDMEN1KMT2ASLC6A2
SCHEMBL21189664 0.65 IDO1 (0.38) HPGDMEN1KMT2ASLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed