SCHEMBL21215345

SCHEMBL21215345

CC(C#N)=NOCC#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13647061 0.78
SCHEMBL21215296 0.76
SCHEMBL21215218 0.73
SCHEMBL21215297 0.73 ALDH1A1 (0.34)
SCHEMBL13319199 0.69
SCHEMBL12186071 0.69
SCHEMBL18436005 0.69
SCHEMBL9411054 0.65 L3MBTL1 (0.44)
SCHEMBL9182774 0.65 L3MBTL1 (0.44)
SCHEMBL23367853 0.63 IDO1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11647583-B2 Prepreg, metal-clad laminated board, and printed wiring board PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2023-05-09 US disclosed
US-10980233-B2 Oxadiazole compound and use thereof as pesticides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-04-20 US disclosed
US-20190230928-A1 OXADIAZOLE COMPOUND AND USE THEREOF AS PESTICIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-01 US disclosed
EP-3318557-A2 QUINOLONE COMPOUND Otsuka Pharmaceutical Co., Ltd. (JP) 2018-05-09 EP disclosed
EP-3075729-A1 PYRAZOLE AMIDE COMPOUND AND APPLICATION THEREOF Shenyang Sinochem Agrochemicals R & D Co., Ltd. (CN) 2016-10-05 EP disclosed
US-20160046552-A1 COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2016-02-18 US disclosed
US-9244346-B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US disclosed
US-8889323-B2 Photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2014-11-18 US disclosed
US-20140231729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 US disclosed
US-20140178808-A1 PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2014-06-26 US disclosed
US-7608595-B2 4''-deoxy-4''-(S) N-methyl-methoxycarbonylamino-avermectin; pesticide; crop protection MERIAL LIMITED (US) 2009-10-27 US disclosed
US-7608595-B2 4''-deoxy-4''-(S) N-methyl-methoxycarbonylamino-avermectin; pesticide; crop protection MERIAL LIMITED (US) 2009-10-27 US disclosed
US-20090240061-A1 Method for forming a carbon-carbon or carbon-heteroatom bond SHASUN PHARMA SOLUTIONS, INC. (US) 2009-09-24 US disclosed
EP-1969939-A2 Nematicidal compositions Devgen NV (BE) 2008-09-17 EP disclosed
EP-1969940-A2 Nematicidal compositions Devgen NV (BE) 2008-09-17 EP disclosed
EP-1941799-A2 Nematicidal compositions Devgen NV (BE) 2008-07-09 EP disclosed
EP-1938691-A2 Nematicidal compositions Devgen NV (BE) 2008-07-02 EP disclosed
US-7214465-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
US-7202367-B2 Process for arylating or vinylating or alkynating a nucleophilic compound RHODIA CHIMIE (FR) 2007-04-10 US disclosed
US-20070010556-A1 Thiophene derivatives as chk 1 inhibitors ASTRAZENECA AB (SE) 2007-01-11 US disclosed