Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.33 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1044347 | 0.94 | TSHR (0.31) | L3MBTL1MAPTTDP1SMN1; SMN2TSHR | |
| SCHEMBL215820 | 0.88 | TSHR (0.34) | TSHR | |
| SCHEMBL29366880 | 0.88 | TSHR (0.34) | TSHR | |
| SCHEMBL216741 | 0.87 | TDP1 (0.34) | L3MBTL1MAPTTDP1SMN1; SMN2TSHR | |
| SCHEMBL213172 | 0.74 | TSHR (0.34) | TSHR | |
| SCHEMBL30771659 | 0.74 | SMN1; SMN2 (0.52) | MAPTSMN1; SMN2TSHRKDM4E | |
| SCHEMBL466247 | 0.73 | LTA4H (0.40) | — | |
| SCHEMBL215324 | 0.73 | TDP1 (0.39) | MAPTTDP1TSHR | |
| SCHEMBL29366886 | 0.73 | TDP1 (0.39) | MAPTTDP1TSHR | |
| SCHEMBL2830458 | 0.73 | TSHR (0.33) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230322998-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | BLUE CUBE IP LLC | 2023-10-12 | — | — | US | claimed |
| EP-4157905-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | Blue Cube IP LLC (US) | 2023-04-05 | — | — | EP | claimed |
| US-20100119835-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN INTERNATIONAL LLC (US) | 2010-05-13 | — | — | US | claimed |
| EP-2118197-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2009-11-18 | — | — | EP | claimed |
| WO-2008110512-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2008-09-18 | — | — | WO | claimed |
| US-20230364928-A1 | INKJET INK, METHOD FOR MANUFACTURING PRINTED MATERIAL, AND PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230322998-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | BLUE CUBE IP LLC | 2023-10-12 | — | — | US | disclosed |
| EP-4157905-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | Blue Cube IP LLC (US) | 2023-04-05 | — | — | EP | disclosed |
| US-20210237484-A1 | METHOD FOR PRODUCING INKJET PRINTED MATERIAL AND INKJET PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2021-08-05 | — | — | US | disclosed |
| EP-3199520-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-25 | — | — | EP | disclosed |
| US-10386721-B2 | Pattern formation method and electronic device manufactured using same | ADEKA CORPORATION (JP) | 2019-08-20 | — | — | US | disclosed |
| EP-3272737-B1 | SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORP (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-1277776-A1 | Photocurable resin composition for sealing material and method of sealing | Mitsui Chemicals, Inc. (JP) | 2003-01-22 | — | — | EP | disclosed |
| US-6368769-B1 | PHOTOPOLYMERIZATION | ASAHI DENKI KOGYO KABUSHIKI KAISHA (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6365644-B1 | TO PROVIDE CURED PRODUCT HAVING MECHANICAL STRENGTH AND MINIMIZED SHRINKAGE DURING CURING TO ENSURE HIGH DIMENSIONAL ACCURACY | DSM N.V. (NL) | 2002-04-02 | — | — | US | disclosed |
| EP-1138739-A1 | PHOTOCURABLE RESIN COMPOSITION FOR SEALING MATERIAL AND METHOD OF SEALING | Mitsui Chemicals, Inc. (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-0848294-B1 | Photo-curable resin composition used for photo-fabrication of three-dimensional objects | DSM NV (NL) | 2001-09-19 | — | — | EP | disclosed |
| EP-1036789-A1 | NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-5981616-A | OXETANE COMPOUND, EPOXY COMPOUND CONSISTING OF EXPOXIDIZED POLYMERS OF CONJUGATED DIENE MONOMERS, EXPOXIDIZED COPOLYMERS OF DIENE MONOMERS AND COMPOUNDS HAVING AN ETHYLENICALLY UNSATURATED BOND, AND EXPOXIDIZED NATURAL RUBBER | DSM N.V. (NL) | 1999-11-09 | — | — | US | disclosed |
| EP-0848294-A1 | Photo-curable resin composition used for photo-fabrication of three-dimensional objects | DSM N.V. (NL) | 1998-06-17 | — | — | EP | disclosed |