Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL214191 | 0.97 | CYP17A1 (0.42) | CYP17A1CYP19A1ALDH1A1TSHRTHRB | |
| SCHEMBL951656 | 0.88 | CYP17A1 (0.40) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL24592077 | 0.86 | CYP17A1 (0.42) | CYP17A1CYP19A1 | |
| SCHEMBL950092 | 0.85 | THRB (0.44) | CYP17A1CYP19A1ALDH1A1TSHRTHRB | |
| SCHEMBL950137 | 0.85 | ALDH1A1 (0.35) | ALDH1A1TSHRTHRBEPHX2 | |
| SCHEMBL686058 | 0.85 | ALDH1A1 (0.35) | CYP17A1CYP19A1ALDH1A1TSHRTHRB | |
| SCHEMBL17247236 | 0.84 | CYP17A1 (0.36) | CYP17A1CYP19A1ALDH1A1TSHRTHRB | |
| SCHEMBL14370444 | 0.84 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL951658 | 0.84 | CYP17A1 (0.38) | CYP17A1CYP19A1 | |
| SCHEMBL949381 | 0.84 | THRB (0.36) | CYP17A1CYP19A1ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-9097971-B2 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9097971-B2 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8795947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795948-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795948-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8735045-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20100015552-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20100015552-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20090269694-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090269694-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090269694-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090214982-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090214982-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090214982-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2093213-A1 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-26 | — | — | EP | disclosed |
| EP-2093213-A1 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-26 | — | — | EP | disclosed |