SCHEMBL21294030

SCHEMBL21294030

Nc1ccccc1[SH](CCOC(=O)c1ccc(C(=O)OCC[SH](c2ccccc2N)c2ccccc2N)cc1)c1ccccc1N

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 4/20 0.48
▸ RAB9A P51151 4/20 0.48
▸ TDP1 Q9NUW8 3/20 0.46
▸ LMNA P02545 3/20 0.44
▸ TSHR P16473 4/20 0.43
▸ CYP3A4 P08684 3/20 0.43
▸ CYP1A2 P05177 2/20 0.43
▸ CYP2C9 P11712 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ PDE4D Q08499 1/20 0.43
▸ ESR1 P03372 2/20 0.42
▸ PHLPP2 Q6ZVD8 1/20 0.42
▸ ESR2 Q92731 1/20 0.42
▸ ALDH1A1 P00352 7/20 0.41
▸ HSD17B10 Q99714 4/20 0.41
▸ HPGD P15428 2/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.41
▸ MAPT P10636 1/20 0.41
▸ TP53 P04637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3306592 0.73 NPC1 (0.49) NPC1RAB9ATDP1LMNATSHR
SCHEMBL16217656 0.69 TDP1 (0.79) NPC1RAB9ATDP1LMNATSHR
SCHEMBL547137 0.69 TDP1 (0.79) NPC1RAB9ATDP1LMNATSHR
SCHEMBL13292516 0.69 TDP1 (0.79) NPC1RAB9ATDP1LMNATSHR
SCHEMBL27574201 0.69 TDP1 (0.66) NPC1RAB9ATDP1LMNATSHR
SCHEMBL27294411 0.69 TDP1 (0.54) NPC1RAB9ATDP1LMNATSHR
SCHEMBL291777 0.68 NPC1 (0.73) NPC1RAB9ATDP1LMNATSHR
SCHEMBL137486 0.67 TDP1 (0.83) NPC1RAB9ATDP1LMNATSHR
SCHEMBL26378 0.67 TDP1 (0.56) NPC1RAB9ATDP1LMNATSHR
SCHEMBL18616298 0.67 TDP1 (0.68) NPC1RAB9ATDP1LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240101819-A1 CURABLE COMPOSITION CONTAINING CYCLIC MULTIFUNCTIONAL MONOMER TOKUYAMA CORPORATION (JP) 2024-03-28 — — US disclosed
US-20240101751-A1 HOLLOW MICROBALLOON TOKUYAMA CORPORATION (JP) 2024-03-28 — — US disclosed
US-20240084067-A1 NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER TOKUYAMA CORPORATION (JP) 2024-03-14 — — US disclosed
US-11912813-B2 Urethane resin using polyrotaxane, and pad for polishing TOKUYAMA CORPORATION (JP) 2024-02-27 — — US disclosed
US-20230390890-A1 POLYMERIZABLE FUNCTIONAL GROUP-CONTAINING MICROBALLOON TOKUYAMA CORPORATION (JP) 2023-12-07 — — US disclosed
EP-4286435-A1 NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER Tokuyama Corporation (JP) 2023-12-06 — — EP disclosed
EP-4286434-A1 NOVEL FINE HOLLOW PARTICLES COMPRISING MELAMINE-BASED RESIN Kagoshima University (JP) 2023-12-06 — — EP disclosed
EP-4286439-A1 HOLLOW MICROBALLOON Tokuyama Corporation (JP) 2023-12-06 — — EP disclosed
EP-4286442-A1 CURABLE COMPOSITION CONTAINING CYCLIC MULTIFUNCTIONAL MONOMER Tokuyama Corporation (JP) 2023-12-06 — — EP disclosed
US-20230365739-A1 CURABLE COMPOSITION AND CURED ARTICLE THEREOF TOKUYAMA CORPORATION (JP) 2023-11-16 — — US disclosed
US-20230203234-A1 HOLLOW MICROBALLOONS TOKUYAMA CORPORATION (JP) 2023-06-29 — — US disclosed
US-20230151179-A1 HOLLOW MICROBALLOONS FOR CMP POLISHING PAD TOKUYAMA CORPORATION (JP) 2023-05-18 — — US disclosed
EP-3795608-B1 LOW MOISTURE CONTENT POLYROTAXANE MONOMER AND CURABLE COMPOSITION COMPRISING SAID MONOMER TOKUYAMA CORP (JP) 2022-12-28 — — EP disclosed
US-20210155736-A1 URETHANE RESIN USING POLYROTAXANE, AND PAD FOR POLISHING TOKUYAMA CORPORATION (JP) 2021-05-27 — — US disclosed
US-20210122874-A1 LOW MOISTURE CONTENT POLYROTAXANE MONOMER AND CURABLE COMPOSITION COMPRISING SAID MONOMER TOKUYAMA CORPORATION (JP) 2021-04-29 — — US disclosed
EP-3795608-A1 LOW MOISTURE CONTENT POLYROTAXANE MONOMER AND CURABLE COMPOSITION COMPRISING SAID MONOMER Tokuyama Corporation (JP) 2021-03-24 — — EP disclosed
EP-3778688-A1 URETHANE RESIN USING POLYROTAXANE, AND PAD FOR POLISHING Tokuyama Corporation (JP) 2021-02-17 — — EP disclosed
US-10920007-B2 Urethane resin comprising a polyrotaxane and polishing pad TOKUYAMA CORPORATION (JP) 2021-02-16 — — US disclosed
EP-3543267-A1 URETHANE RESIN USING POLYROTAXANE, AND POLISHING PAD Tokuyama Corporation (JP) 2019-09-25 — — EP disclosed
US-20190263961-A1 URETHANE RESIN COMPRISING A POLYROTAXANE AND POLISHING PAD TOKUYAMA CORPORATION (JP) 2019-08-29 — — US disclosed
Send feedback