⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10893879 | 1.00 | — | — | |
| SCHEMBL3151163 | 0.85 | — | — | |
| SCHEMBL8621576 | 0.83 | — | — | |
| SCHEMBL9323811 | 0.83 | — | — | |
| SCHEMBL8011667 | 0.82 | OPRM1 (0.31) | — | |
| SCHEMBL17650 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL1066104 | 0.76 | — | — | |
| SCHEMBL302745 | 0.74 | — | — | |
| SCHEMBL5678512 | 0.72 | — | — | |
| SCHEMBL21409762 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114262600-A | Low-water-vapor-permeability silicone sealant | 广州市白云化工实业有限公司 | 2022-04-01 | — | — | CN | claimed |
| CN-110527293-B | Basalt flake fiber modified polyimide film | 黑龙江省科学院高技术研究院 | 2022-03-15 | — | — | CN | claimed |
| CN-106902396-B | Method for preparing antibacterial surface on surface of medical material | 华南理工大学 | 2021-01-19 | — | — | CN | claimed |
| CN-111944331-A | Surface modification treatment method of anti-settling boron carbide powder | 上海核工程研究设计院有限公司 | 2020-11-17 | — | — | CN | claimed |
| EP-3069778-B1 | COMPOSITION FOR REMOVING ALDEHYDE FROM AIR | ARMSTRONG WORLD IND INC (US) | 2018-03-07 | — | — | EP | claimed |
| EP-2313178-B1 | ALDEHYDE REDUCING COMPOSITIONS | AWI LICENSING CO (US) | 2016-05-18 | — | — | EP | claimed |
| US-6737119-B1 | DISPERSION OF A VINYL-MODIFIED COLLOIDAL SILICA, PLATINUM CHELATE CATALYST, A POLYSILOXANE WATER-DISPERSIBLE SILICONE EMULSION | TORAY SAEHAN INCORPORATION (KR) | 2004-05-18 | — | — | US | claimed |
| EP-0972303-A1 | LOW DIELECTRIC CONSTANT MATERIAL WITH IMPROVED DIELECTRIC STRENGTH | W.L. GORE & ASSOCIATES, INC. (US) | 2000-01-19 | — | — | EP | claimed |
| WO-1998044544-A1 | LOW DIELECTRIC CONSTANT MATERIAL WITH IMPROVED DIELECTRIC STRENGTH | W.L. GORE & ASSOCIATES, INC. (US) | 1998-10-08 | — | — | WO | claimed |
| WO-1998044546-A1 | METHOD TO IMPROVE ADHESION OF A THIN SUBMICRON FLUOROPOLYMER FILM ON AN ELECTRONIC DEVICE | W.L. GORE & ASSOCIATES, INC. (US) | 1998-10-08 | — | — | WO | claimed |
| WO-1998044545-A1 | METHOD TO IMPROVE ADHESION OF A THIN SUBMICRON FLUOROPOLYMER FILM ON AN ELECTRONIC DEVICE | W.L. GORE & ASSOCIATES, INC. (US) | 1998-10-08 | — | — | WO | claimed |
| US-4427034-A | AMINOALKOXYSILANE WITH AN ALKYD, EPOXY, OR ACRYLIC RESIN, OR POLYURETHANE | SUMITOMO LIGHT METAL INDUSTRIES, LTD. (JP) | 1984-01-24 | — | — | US | claimed |
| WO-2023233512-A1 | COLLOIDAL SILICA AND METHOD FOR PRODUCING SAME | 扶桑化学工業株式会社 | 2023-12-07 | — | — | WO | disclosed |
| EP-4051737-B1 | WOOD POLYMER COMPOSITES AND ADDITIVE SYSTEMS THEREFOR | STRUKTOL COMPANY OF AMERICA LLC (US) | 2023-08-16 | — | — | EP | disclosed |
| CN-114262600-A | Low-water-vapor-permeability silicone sealant | 广州市白云化工实业有限公司 | 2022-04-01 | — | — | CN | disclosed |
| CN-110527293-B | Basalt flake fiber modified polyimide film | 黑龙江省科学院高技术研究院 | 2022-03-15 | — | — | CN | disclosed |
| EP-0108946-A2 | Curing composition | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1984-05-23 | — | — | EP | disclosed |
| US-4427034-A | AMINOALKOXYSILANE WITH AN ALKYD, EPOXY, OR ACRYLIC RESIN, OR POLYURETHANE | SUMITOMO LIGHT METAL INDUSTRIES, LTD. (JP) | 1984-01-24 | — | — | US | disclosed |
| US-4332874-A | Photosensitive bis-azide composition with acrylic terpolymer and pattern-forming method | HITACHI, LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| EP-0028486-A1 | Photosensitive composition and pattern-forming method | Hitachi, Ltd. (JP) | 1981-05-13 | — | — | EP | disclosed |