SCHEMBL21328426

SCHEMBL21328426

NC(=O)Cc1cc(=O)[nH]c(=S)[nH]1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.53
CYP2C19 P33261 2/20 0.53
LPO P22079 2/20 0.53
TAS2R38 P59533 2/20 0.53
MPO P05164 1/20 0.53
TPO P07202 1/20 0.53
MAPT P10636 2/20 0.51
SMN1; SMN2 Q16637 4/20 0.49
KMT2A Q03164 2/20 0.49
BAZ2B Q9UIF8 1/20 0.47
CYB5R3 P00387 3/20 0.45
ALDH1A1 P00352 2/20 0.45
CYP3A4 P08684 1/20 0.45
PTGS1 P23219 1/20 0.42
SIRT1 Q96EB6 1/20 0.41
HSD17B10 Q99714 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
THRB P10828 1/20 0.33
HTT P42858 1/20 0.33
CASP1 P29466 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13883155 0.81 SMN1; SMN2 (0.57) TSHRMAPTSMN1; SMN2ALDH1A1SIRT1
SCHEMBL22640186 0.77 MAPT (0.60) TSHRCYP2C19LPOTAS2R38MPO
SCHEMBL11741161 0.73 CYP2C19 (0.67) TSHRCYP2C19LPOTAS2R38MPO
SCHEMBL23160962 0.72 LPO (0.71) TSHRCYP2C19LPOTAS2R38MPO
Propylthiouracil SCHEMBL2322792 0.70 CYP2C19 (0.76) TSHRCYP2C19LPOTAS2R38MPO
SCHEMBL141453 0.70 KMT2A (0.61) TSHRCYP2C19LPOTAS2R38MPO
Propylthiouracil SCHEMBL5493716 0.69 LPO (1.00) TSHRCYP2C19LPOTAS2R38MPO
Propylthiouracil SCHEMBL41239 0.69 LPO (1.00) TSHRCYP2C19LPOTAS2R38MPO
SCHEMBL11584056 0.67 KMT2A (0.65) TSHRCYP2C19LPOTAS2R38MPO
Propylthiouracil SCHEMBL15455780 0.67 TSHR (0.62) TSHRCYP2C19LPOTAS2R38MPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230004085-A1 METHOD FOR MANUFACTURING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PREMIX SOLUTION FOR PREPARING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING PHOTOSENSITIVE DRY FILM, AND METHOD FOR MANUFACTURING PATTERNED RESIST FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-05 US disclosed
CN-114641727-A Method for producing photosensitive composition, premix for production, photosensitive composition, dry film, and method for producing resist film 东京应化工业株式会社 2022-06-17 CN disclosed
US-20190278178-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE TOKYO INSTITUTE OF TECHNOLOGY (JP) 2019-09-12 US disclosed