SCHEMBL21378835

SCHEMBL21378835

C1CC[C](C23CC4CC(CC(C4)C2)C3)C1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.40
HSD17B1 P14061 1/20 0.40
LMNA P02545 4/20 0.38
ALDH1A1 P00352 2/20 0.38
GRIN2D O15399 2/20 0.36
GRIN3B O60391 2/20 0.36
GRIN1 Q05586 2/20 0.36
GRIN2A Q12879 2/20 0.36
GRIN2B Q13224 2/20 0.36
GRIN2C Q14957 2/20 0.36
GRIN3A Q8TCU5 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
TSHR P16473 2/20 0.35
SLC22A2 O15244 1/20 0.35
SLC22A1 O15245 1/20 0.35
NFKB1 P19838 1/20 0.35
STAT6 P42226 1/20 0.35
SLC47A1 Q96FL8 1/20 0.35
SIGMAR1 Q99720 1/20 0.35
POLB P06746 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10529647 0.97 HSD11B1 (0.43) HSD11B1HSD17B1LMNAALDH1A1GRIN2D
SCHEMBL6400549 0.97 HSD11B1 (0.43) HSD11B1HSD17B1LMNAALDH1A1GRIN2D
SCHEMBL19747326 0.88 LMNA (0.41) HSD11B1HSD17B1LMNAALDH1A1GRIN2D
SCHEMBL29098251 0.86 HSD11B1 (0.33) HSD11B1HSD17B1
SCHEMBL28699934 0.67 LMNA (0.37) HSD11B1HSD17B1LMNAALDH1A1TSHR
SCHEMBL28058812 0.66 CA1 (0.39) HSD11B1HSD17B1LMNAALDH1A1GRIN2D
SCHEMBL2763437 0.63 LMNA (0.77) LMNAALDH1A1GRIN2DGRIN3BGRIN1
SCHEMBL8700276 0.62 LMNA (0.34) HSD11B1HSD17B1LMNAALDH1A1GRIN2D
SCHEMBL548854 0.61 POLB (0.43) LMNAALDH1A1GRIN2DGRIN3BGRIN1
SCHEMBL28299622 0.61 LMNA (0.43) LMNAALDH1A1GRIN2DGRIN3BGRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3556783-B1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL CO (JP) 2022-12-28 EP disclosed
US-11198748-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-14 US disclosed
EP-3556783-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Sumitomo Chemical Company, Limited (JP) 2019-10-23 EP disclosed
US-20190292287-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-09-26 US disclosed