Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.37 |
| ▸ | CES1 | P23141 | 1/20 | 0.37 |
| ▸ | CD81 | P60033 | 2/20 | 0.36 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.32 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25234936 | 0.73 | LMNA (0.38) | CD81GRIK2EPHX1 | |
| SCHEMBL464872 | 0.73 | LMNA (0.38) | CD81GRIK2EPHX1 | |
| SCHEMBL1770285 | 0.73 | LMNA (0.38) | CD81GRIK2EPHX1 | |
| SCHEMBL16267791 | 0.73 | LMNA (0.38) | CD81GRIK2EPHX1 | |
| SCHEMBL9090277 | 0.73 | LMNA (0.38) | CD81GRIK2EPHX1 | |
| SCHEMBL28107449 | 0.71 | CES2 (0.41) | CES2CES1HDAC8HDAC6HSD11B1 | |
| SCHEMBL6358584 | 0.71 | CES2 (0.41) | CES2CES1HDAC8HDAC6HSD11B1 | |
| SCHEMBL5003950 | 0.71 | CD81 (0.36) | CD81GRIK2 | |
| SCHEMBL5006598 | 0.70 | CD81 (0.40) | CD81GRIK2HSD11B1EPHX1 | |
| SCHEMBL28442378 | 0.70 | GRIK2 (0.34) | CES2CES1CD81GRIK2HDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2019181228-A1 | PHOTORESIST RESIN, PRODUCTION METHOD FOR PHOTORESIST RESIN, PHOTORESIST RESIN COMPOSITION, AND PATTERN FORMATION METHOD | 株式会社ダイセル | 2019-09-26 | — | — | WO | disclosed |