SCHEMBL21391752

SCHEMBL21391752

Cc1ccc(CS(=O)(=O)Cc2ccc(C)c(C)c2)cc1C

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ALDH1A1 P00352 5/20 0.41
KMT2A Q03164 2/20 0.41
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
CA9 Q16790 2/20 0.38
HTT P42858 2/20 0.38
CA12 O43570 1/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
CA5A P35218 1/20 0.37
PKM P14618 2/20 0.36
MAPK1 P28482 1/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
POLB P06746 1/20 0.35
FFAR4 Q5NUL3 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14410521 0.84 LMNA (0.42) LMNATDP1ALDH1A1CA1CA2
SCHEMBL30785385 0.83 LMNA (0.41) LMNATDP1ALDH1A1KMT2ACA1
SCHEMBL30785386 0.83 LMNA (0.41) LMNATDP1ALDH1A1KMT2ACA1
SCHEMBL23292574 0.83 LMNA (0.41) LMNATDP1ALDH1A1KMT2ACA1
SCHEMBL24415722 0.83 CA2 (0.53) LMNATDP1ALDH1A1KMT2ACA1
SCHEMBL23746449 0.81 S1PR1 (0.39) LMNATDP1ALDH1A1KMT2ACA1
SCHEMBL8751233 0.81 ALDH1A1 (0.46) LMNAALDH1A1KMT2ARAB9A
SCHEMBL31096849 0.81 NPC1 (0.39) LMNAALDH1A1KMT2ACA1CA2
SCHEMBL28488417 0.81 NPC1 (0.39) LMNAALDH1A1KMT2ACA1CA2
SCHEMBL16002843 0.79 HTR1D (0.43) LMNATDP1HTTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11518876-B2 Photosensitive resin composition and photosensitive dry film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-12-06 US disclosed
US-11294283-B2 Photosensitive resin composition, photosensitive resin laminate, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-05 US disclosed
US-20200140678-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-05-07 US disclosed
US-20190294045-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-09-26 US disclosed