SCHEMBL214376

SCHEMBL214376

CCC1(COCC(C)O)COC1

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.41
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
CTSK P43235 1/20 0.31
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1666633 0.87 TSHR (0.33) TSHREPHX1
SCHEMBL14256290 0.85 TSHR (0.31) TSHRCTSK
SCHEMBL6765811 0.85 TSHR (0.31) TSHRCTSK
SCHEMBL12702640 0.84 TSHR (0.32) HSD17B10TSHR
SCHEMBL3101654 0.83 TSHR (0.30) TSHR
SCHEMBL7746437 0.82 TSHR (0.32) TSHR
SCHEMBL21941196 0.82 TSHR (0.32) TSHR
SCHEMBL20998067 0.82 HSD17B10 (0.34) HSD17B10TSHRTDP1
SCHEMBL2993275 0.82 USP2 (0.40) TSHRCTSKEPHX1
SCHEMBL13294290 0.81 CTSK (0.31) TSHRCTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 532 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230322998-A1 PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY BLUE CUBE IP LLC 2023-10-12 US claimed
EP-4157905-A1 PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY Blue Cube IP LLC (US) 2023-04-05 EP claimed
US-20100119835-A1 PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES HUNTSMAN INTERNATIONAL LLC (US) 2010-05-13 US claimed
EP-2118197-A1 PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES Huntsman Advanced Materials (Switzerland) GmbH (CH) 2009-11-18 EP claimed
WO-2008110512-A1 PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2008-09-18 WO claimed
CN-122029213-A Electron beam curable compositions for producing coil coatings 佩什托普公司 2026-05-12 CN disclosed
US-12624247-B2 Film LG CHEM, LTD. (KR) 2026-05-12 US disclosed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-4722199-A1 AZOLE COMPOUND, METHOD FOR SYNTHESIZING SAID AZOLE COMPOUND, AND USE THEREOF SHIKOKU CHEMICALS CORPORATION (JP) 2026-04-08 EP disclosed
US-20260092142-A1 RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR TORAY INDUSTRIES, INC. (JP) 2026-04-02 US disclosed
EP-3787878-B1 METHODS OF POST-PROCESSING PHOTOFABRICATED ARTICLES CREATED VIA ADDITIVE FABRICATION STRATASYS INC (US) 2026-02-18 EP disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-1277776-A1 Photocurable resin composition for sealing material and method of sealing Mitsui Chemicals, Inc. (JP) 2003-01-22 EP disclosed
US-6368769-B1 PHOTOPOLYMERIZATION ASAHI DENKI KOGYO KABUSHIKI KAISHA (JP) 2002-04-09 US disclosed
US-6365644-B1 TO PROVIDE CURED PRODUCT HAVING MECHANICAL STRENGTH AND MINIMIZED SHRINKAGE DURING CURING TO ENSURE HIGH DIMENSIONAL ACCURACY DSM N.V. (NL) 2002-04-02 US disclosed
EP-1138739-A1 PHOTOCURABLE RESIN COMPOSITION FOR SEALING MATERIAL AND METHOD OF SEALING Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed
EP-0848294-B1 Photo-curable resin composition used for photo-fabrication of three-dimensional objects DSM NV (NL) 2001-09-19 EP disclosed
EP-1036789-A1 NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 2000-09-20 EP disclosed
US-5981616-A OXETANE COMPOUND, EPOXY COMPOUND CONSISTING OF EXPOXIDIZED POLYMERS OF CONJUGATED DIENE MONOMERS, EXPOXIDIZED COPOLYMERS OF DIENE MONOMERS AND COMPOUNDS HAVING AN ETHYLENICALLY UNSATURATED BOND, AND EXPOXIDIZED NATURAL RUBBER DSM N.V. (NL) 1999-11-09 US disclosed
EP-0848294-A1 Photo-curable resin composition used for photo-fabrication of three-dimensional objects DSM N.V. (NL) 1998-06-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624247-B2 Film RAD51, COL2A1, COL1A1 HSD17B10 2498/4885TSHR 545/4885TDP1 914/4885
US-20260092142-A1 RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR PTGER1, RPTOR, LCP1 HSD17B10 4613/4885TSHR 2031/4885TDP1 2623/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.