SCHEMBL214650

SCHEMBL214650

C=Cc1ccc2c(Br)cccc2c1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SLC9A1 P19634 1/20 0.41
TP53 P04637 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
ALDH1A1 P00352 2/20 0.37
BACE1 P56817 1/20 0.35
TSHR P16473 1/20 0.33
PARP1 P09874 1/20 0.33
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
TRPA1 O75762 1/20 0.31
RELA Q04206 1/20 0.31
CYP1A2 P05177 1/20 0.31
AHR P35869 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
RXFP1 Q9HBX9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL214543 0.85 TDP1 (0.39) SLC9A1TP53TDP1ALDH1A1BACE1
SCHEMBL5385215 0.81 ALDH1A1 (0.48) SLC9A1ALDH1A1BACE1
SCHEMBL29592963 0.78 TP53 (0.41) SLC9A1TP53TDP1ALDH1A1TSHR
SCHEMBL16289907 0.78 TP53 (0.41) TP53TDP1ALDH1A1TSHRPARP1
SCHEMBL12986970 0.78 TP53 (0.41) SLC9A1TP53TDP1ALDH1A1TSHR
SCHEMBL216389 0.77 CYP1A2 (0.48) TP53TDP1ALDH1A1TSHRPARP1
SCHEMBL16289909 0.77 CYP1A2 (0.57) TP53TDP1ALDH1A1TSHRPARP1
SCHEMBL472325 0.77 PLAU (0.53) TP53TDP1ESR1ESR2TRPA1
SCHEMBL214973 0.77 TP53 (0.39) TP53TDP1ALDH1A1TSHRPARP1
SCHEMBL29742946 0.77 PLAU (0.53) TP53TDP1ESR1ESR2TRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780600-B1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM NISSAN CHEMICAL IND LTD (JP) 2014-02-26 EP disclosed
US-8088546-B2 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-01-03 US disclosed
CN-1977220-B Lower layer film forming composition for lithography including naphthalene ring having halogen atom NISSAN CHEMICAL IND LTD 2010-12-01 CN disclosed
US-20070238029-A1 Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-11 US disclosed
EP-1780600-A1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM Nissan Chemical Industries, Ltd. (JP) 2007-05-02 EP disclosed