SCHEMBL21469746

SCHEMBL21469746

Cc1cc(C(C)(C)c2ccc(OCC(C)O)c(C)c2)ccc1O

nearest known ligand 0.57

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 11/20 0.57
VDR P11473 7/20 0.45
AR P10275 4/20 0.45
RORC P51449 1/20 0.44
HDAC3 O15379 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12573978 0.86 AR (0.62) ESR1VDRAR
SCHEMBL18780293 0.86 ESR1 (0.54) ESR1VDRARRORC
SCHEMBL23054256 0.82 ESR1 (0.73) ESR1ARRORC
SCHEMBL20057511 0.80 TP53 (0.51) VDRARHDAC3HDAC6
SCHEMBL23462211 0.80 ESR1 (0.47) ESR1VDRARRORC
SCHEMBL5012376 0.78 VDR (0.69) VDRAR
SCHEMBL23462173 0.77 ESR1 (0.43) ESR1VDRARRORC
SCHEMBL30277599 0.77 VDR (0.44) VDRARHDAC3HDAC6
SCHEMBL30365876 0.77 VDR (0.44) VDRARHDAC3HDAC6
SCHEMBL2949160 0.77 VDR (0.75) VDRARHDAC3HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3553601-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2019-10-16 EP disclosed