Sulfuric Acid

Sulfuric Acid

SCHEMBL2148402

CCCCN(CCCC)CCCC.O=S(=O)(O)O

nearest known ligand 0.46

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 known ✓ P08172 1/20 0.37
SCN1A known ✓ P35498 1/20 0.37
SLC6A3 known ✓ Q01959 1/20 0.37
SCN2A known ✓ Q99250 1/20 0.37
SCN3A known ✓ Q9NY46 1/20 0.37
CA1 P00915 5/20 0.46
CA12 O43570 2/20 0.46
CA9 Q16790 2/20 0.46
NPSR1 Q6W5P4 1/20 0.45
TP53 P04637 1/20 0.43
KDM5A P29375 4/20 0.42
PHF8 Q9UPP1 2/20 0.40
KDM4C Q9H3R0 2/20 0.40
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP3 P08254 1/20 0.38
MMP8 P22894 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL27883459 1.00 CA1 (0.46) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL5874269 1.00 CA1 (0.46) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL7196007 0.93 KDM5A (0.49) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL7196009 0.93 KDM5A (0.49) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL7202255 0.92 TP53 (0.46) CA1CA12CA9NPSR1TP53
SCHEMBL4644169 0.92 CA1 (0.44) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL7202252 0.92 TP53 (0.46) CA1CA12CA9NPSR1TP53
SCHEMBL27883468 0.92 KDM5A (0.46) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL1131747 0.91 CA12 (0.40) CA1CA12CA9NPSR1TP53
Sulfuric Acid SCHEMBL1131025 0.91 CA12 (0.40) CA1CA12CA9NPSR1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP claimed
CN-113801125-B Preparation method of cyclic anhydride 安徽泰格维生素实业有限公司 2023-11-03 CN claimed
CN-107710462-B Electrochemical hydrogen storage electrode and battery 巴斯夫公司 2022-08-02 CN claimed
CN-113801125-A Preparation method of cyclic anhydride 安徽泰格维生素实业有限公司 2021-12-17 CN claimed
CN-107615556-B Electrolyte and metal hydride battery 巴斯夫公司 2021-11-02 CN claimed
CN-107004912-B Electrolyte and metal hydride battery 巴斯夫公司 2021-07-30 CN claimed
EP-3292578-B1 ELECTROCHEMICAL HYDROGEN STORAGE ELECTRODES AND CELLS BASF CORP (US) 2021-02-24 EP claimed
CN-105873671-B9 System and method for screening solvent for dissolving tank bottom sludge 印度马德拉斯理工学院 2020-12-18 CN claimed
CN-105873671-B System and method for screening solvent for dissolving tank bottom sludge 印度马德拉斯理工学院 2020-10-30 CN claimed
EP-2450412-A1 Silicone coating composition AZ Electronic Materials USA Corp. (US) 2012-05-09 EP claimed
EP-2121857-A1 SILICONE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2009-11-25 EP claimed
WO-2008102256-A1 SILICONE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-28 WO claimed
US-20080196626-A1 High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry MERCK PATENT GMBH (DE) 2008-08-21 US claimed
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP disclosed
US-11939521-B2 Reuse of hypersaline brine with ionic liquids SAUDI ARABIAN OIL COMPANY (SA) 2024-03-26 US disclosed
US-20240059958-A1 REUSE OF HYPERSALINE BRINE WITH IONIC LIQUIDS SAUDI ARABIAN OIL COMPANY (SA) 2024-02-22 US disclosed
US-4532188-A Electrically conductive pyrrole copolymer article BASF AKTIENGESELLSCHAFT (DE) 1985-07-30 US disclosed
US-4223166-A BROMINATION OF A CHLOROPHENOL USING AN INORGANIC TERTIARY AMINE SALT OR QUATERNARY AMMONIUM SALT SOCIETE ANONYME POUR L'INDUSTRIE CHIMIQUE (FR) 1980-09-16 US disclosed
US-4176138-A HYDROGENATION OF NITROBENZENE IN AN ACIDIC REACTION MEDIUM MALLINCKRODT, INC. (US) 1979-11-27 US disclosed
US-4104141-A Electrochemical oxidation of alkoxy-substituted aromatic compounds UOP INC. (US) 1978-08-01 US disclosed