SCHEMBL21484072

SCHEMBL21484072

[BH3-]C#N.[BH3-]C#N.[Ca+2]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8810361 0.93
SCHEMBL31186808 0.86
SCHEMBL31186806 0.86
Potassium Ion SCHEMBL1134250 0.86
SCHEMBL10535377 0.86
SCHEMBL330 0.86
SCHEMBL11835458 0.86
SCHEMBL1121583 0.86
SCHEMBL1370457 0.86
SCHEMBL31186809 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4631936-A1 5-(2-BUTYL-1,3-DIOXOLAN-2-YL)-1-METHYLPENTYL ACETATE AND PROCESS FOR PREPARING 2,7-DIACETOXYUNDECANE THEREFROM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-15 EP disclosed
US-20250313543-A1 5-(2-BUTYL-1,3-DIOXOLAN-2-YL)-1-METHYLPENTYL ACETATE AND PROCESS FOR PREPARING 2,7-DIACETOXYUNDECANE THEREFROM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-09 US disclosed
CN-111348993-B Process for preparing 4-methyl-5-nonene and 4-methyl-5-nonanol 信越化学工业株式会社 2023-11-28 CN disclosed
CN-111348994-B Process for preparing 4-methyl-5-nonene and 4-methyl-5-nonanol 信越化学工业株式会社 2023-10-27 CN disclosed
EP-3556464-B1 METHOD FOR PRODUCING REDUCED HALIDE COMPOUND HAVING UNDERGONE REDUCTION OF CARBON-CARBON UNSATURATED BOND SHINETSU CHEMICAL CO (JP) 2023-08-02 EP disclosed
CN-110386863-B Method for producing reduced halide having reduced carbon-carbon unsaturated bond 信越化学工业株式会社 2023-02-28 CN disclosed
EP-3670484-B1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL SHINETSU CHEMICAL CO (JP) 2022-03-02 EP disclosed
EP-3670486-B1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL SHINETSU CHEMICAL CO (JP) 2022-02-16 EP disclosed
US-10882806-B2 Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-05 US disclosed
US-10882805-B2 Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-05 US disclosed
CN-111348993-A Process for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol 信越化学工业株式会社 2020-06-30 CN disclosed
CN-111348994-A Process for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol 信越化学工业株式会社 2020-06-30 CN disclosed
US-20200199053-A1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-25 US disclosed
US-20200199052-A1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-25 US disclosed
EP-3670484-A1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL Shin-Etsu Chemical Co., Ltd. (JP) 2020-06-24 EP disclosed
EP-3670486-A1 PROCESSES FOR PREPARING 4-METHYL-5-NONANONE AND 4-METHYL-5-NONANOL Shin-Etsu Chemical Co., Ltd. (JP) 2020-06-24 EP disclosed
US-10676417-B2 Method for producing reduced halide compound having undergone reduction of carbon-carbon unsaturated bond SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-09 US disclosed
US-20190322607-A1 METHOD FOR PRODUCING REDUCED HALIDE COMPOUND HAVING UNDERGONE REDUCTION OF CARBON-CARBON UNSATURATED BOND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 US disclosed
EP-3556464-A1 METHOD FOR PRODUCING REDUCED HALIDE COMPOUND HAVING UNDERGONE REDUCTION OF CARBON-CARBON UNSATURATED BOND Shin-Etsu Chemical Co., Ltd. (JP) 2019-10-23 EP disclosed