SCHEMBL2149947

SCHEMBL2149947

CC(C)c1ccc2c(=O)c3ccccc3sc2c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.50
ALDH1A1 P00352 7/20 0.50
RAB9A P51151 4/20 0.50
L3MBTL1 Q9Y468 3/20 0.50
NPC1 O15118 3/20 0.50
KDM4E B2RXH2 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
POLB P06746 4/20 0.44
LMNA P02545 2/20 0.44
HCRTR1 O43613 1/20 0.44
KIF11 P52732 1/20 0.44
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
HPGD P15428 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
GAA P10253 1/20 0.43
MAOA P21397 1/20 0.43
MAOB P27338 1/20 0.43
GPR3 P46089 1/20 0.42
MAPK1 P28482 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31537733 1.00 MAPT (0.50) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL30612323 0.90 KDM4E (0.58) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL41594 0.90 KDM4E (0.58) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL29353401 0.90 KDM4E (0.58) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL13338346 0.90 GPR3 (0.54) MAPTALDH1A1RAB9AL3MBTL1NPC1
Hydrogen Sulfide SCHEMBL28826265 0.89 KDM4E (0.57) MAPTALDH1A1RAB9AL3MBTL1NPC1
Hydrochloric Acid SCHEMBL27863586 0.89 KDM4E (0.57) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL28244933 0.89 KDM4E (0.57) MAPTALDH1A1RAB9AL3MBTL1NPC1
Ammonia Solution, Strong SCHEMBL29287857 0.89 KDM4E (0.57) MAPTALDH1A1RAB9AL3MBTL1NPC1
SCHEMBL2705508 0.88 KDM4E (0.44) MAPTALDH1A1RAB9AL3MBTL1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1219238-C Positive resist composition SUMITOMO CHEMICAL CO (JP) 2005-09-14 CN claimed
US-6815140-B2 COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 US claimed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US claimed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US claimed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP claimed
CN-1237719-A Positive resist composition SUMITOMO CHEMICAL CO (JP) 1999-12-08 CN claimed
US-20230203239-A1 Cyclic ether-anhydride photopolyaddition and uses thereof UNIVERSITÉ DE HAUTE-ALSACE (FR) 2023-06-29 US disclosed
US-20230203239-A1 Cyclic ether-anhydride photopolyaddition and uses thereof UNIVERSITÉ DE HAUTE-ALSACE (FR) 2023-06-29 US disclosed
CN-114105943-A 3-substituted thioxanthone compound, preparation method thereof and application of photopolymerization system 深圳有为技术控股集团有限公司 2022-03-01 CN disclosed
US-20210363286-A1 Ultrafast Cyclic Ether-Amine Photopolyaddition And Uses Thereof UNIVERSITÉ DE HAUTE-ALSACE (FR) 2021-11-25 US disclosed
US-10928728-B2 Photoactivable nitrogen bases BASF SE (DE) 2021-02-23 US disclosed
US-20210033972-A1 PHOTOACTIVABLE NITROGEN BASES BASF SE (DE) 2021-02-04 US disclosed
CN-108431075-B Method for frontal polymerization of cationically polymerizable monomers 维也纳科技大学 2020-08-21 CN disclosed
WO-2003091287-A1 INCORPORABLE PHOTOINITIATOR CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-11-06 WO disclosed
WO-2003089479-A2 CURING OF COATINGS INDUCED BY PLASMA CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-10-30 WO disclosed
WO-2003033500-A1 PHOTOACTIVABLE NITROGEN BASES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-04-24 WO disclosed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US disclosed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US disclosed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP disclosed
CN-1237719-A Positive resist composition SUMITOMO CHEMICAL CO (JP) 1999-12-08 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210033972-A1 PHOTOACTIVABLE NITROGEN BASES CBR1, ARNT, NR0B1 MAPT 2792/4885ALDH1A1 1659/4885RAB9A 2502/4885
US-10928728-B2 Photoactivable nitrogen bases CBR1, NR0B1, NR0B2 MAPT 2920/4885ALDH1A1 1733/4885RAB9A 2547/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.