SCHEMBL21500864

SCHEMBL21500864

O=C(Oc1cc(O)c(O)c(O)c1O)c1c(I)ccc(I)c1I

nearest known ligand 0.39

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ SERPINE1 P05121 1/20 0.39
▸ POLB P06746 1/20 0.38
▸ POLA1 P09884 1/20 0.38
▸ ANTXR2 P58335 1/20 0.38
▸ SELL P14151 1/20 0.32
▸ SELP P16109 1/20 0.32
▸ NSD2 O96028 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500857 0.84 SERPINE1 (0.34) SERPINE1POLBPOLA1ANTXR2
SCHEMBL21500854 0.78 SENP1 (0.33) —
SCHEMBL21500898 0.78 KMT2A (0.46) SERPINE1POLB
SCHEMBL21500872 0.76 ESR1 (0.39) SERPINE1
SCHEMBL21500923 0.76 KMT2A (0.44) SERPINE1POLB
SCHEMBL21500851 0.75 MAPT (0.44) SERPINE1POLB
SCHEMBL21500921 0.74 CYP3A4 (0.32) POLB
SCHEMBL22945092 0.73 FABP7 (0.42) SERPINE1POLB
SCHEMBL21500828 0.73 ESR1 (0.57) POLB
SCHEMBL21500874 0.72 KMT2A (0.40) POLBNSD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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