SCHEMBL21500882

SCHEMBL21500882

O=C(Oc1c(I)cc(I)cc1I)c1ccc2ccc(O)cc2c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 8/20 0.46
▸ ESR1 P03372 6/20 0.46
▸ MEN1 O00255 7/20 0.45
▸ CASP3 P42574 2/20 0.45
▸ SENP8 Q96LD8 2/20 0.45
▸ SENP7 Q9BQF6 2/20 0.45
▸ SENP6 Q9GZR1 2/20 0.45
▸ NPC1 O15118 2/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ CLK1 P49759 1/20 0.40
▸ DYRK1A Q13627 1/20 0.40
▸ DYRK1B Q9Y463 1/20 0.40
▸ SENP1 Q9P0U3 1/20 0.40
▸ ESR2 Q92731 4/20 0.38
▸ PKM P14618 1/20 0.38
▸ SLC2A1 P11166 1/20 0.37
▸ SLC2A4 P14672 1/20 0.37
▸ MAPT P10636 1/20 0.36
▸ F12 P00748 1/20 0.36
▸ CYP1A2 P05177 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500881 0.95 KMT2A (0.44) KMT2AESR1MEN1CASP3SENP8
SCHEMBL21500876 0.84 SENP1 (0.54) KMT2AESR1MEN1SENP1ESR2
SCHEMBL21500814 0.76 CA12 (0.42) ESR1SENP1SLC2A1SLC2A4
SCHEMBL21500817 0.76 CA12 (0.47) ESR1SENP1SLC2A1SLC2A4
SCHEMBL19678556 0.74 TPMT (0.50) RAB9ASENP1MAPT
SCHEMBL777641 0.74 KMT2A (0.59) KMT2AESR1MEN1CASP3SENP8
SCHEMBL21500824 0.74 CA12 (0.53) —
SCHEMBL21500819 0.74 CA12 (0.53) KMT2AESR1MEN1ESR2MAPT
SCHEMBL21705620 0.73 LMNA (0.43) KMT2ANPC1RAB9ASENP1PKM
SCHEMBL23386312 0.73 KMT2A (0.66) KMT2AESR1MEN1CASP3SENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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