SCHEMBL21500876

SCHEMBL21500876

O=C(Oc1c(I)cc(I)cc1I)c1ccc(O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SENP1 Q9P0U3 1/20 0.54
▸ CA12 O43570 4/20 0.46
▸ CA1 P00915 4/20 0.46
▸ CA2 P00918 4/20 0.46
▸ CA7 P43166 4/20 0.46
▸ CA9 Q16790 4/20 0.46
▸ CA14 Q9ULX7 4/20 0.46
▸ ESR1 P03372 6/20 0.42
▸ ESR2 Q92731 4/20 0.42
▸ MEN1 O00255 1/20 0.42
▸ KMT2A Q03164 1/20 0.42
▸ TSHR P16473 2/20 0.40
▸ ALDH1A1 P00352 1/20 0.40
▸ CHRM1 P11229 1/20 0.40
▸ SLC6A2 P23975 1/20 0.40
▸ KDR P35968 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ LMNA P02545 3/20 0.39
▸ MAPT P10636 1/20 0.39
▸ PKM P14618 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19678556 0.86 TPMT (0.50) SENP1CA12CA1CA2CA7
SCHEMBL21500881 0.85 KMT2A (0.44) SENP1ESR1ESR2MEN1KMT2A
SCHEMBL21500882 0.84 KMT2A (0.46) SENP1ESR1ESR2MEN1KMT2A
SCHEMBL21705620 0.84 LMNA (0.43) SENP1KMT2ATSHRALDH1A1LMNA
SCHEMBL21500817 0.84 CA12 (0.47) SENP1CA12CA1CA2CA7
SCHEMBL21500814 0.84 CA12 (0.42) SENP1CA12CA1CA2CA7
SCHEMBL24021521 0.83 SENP1 (0.37) SENP1ESR1MEN1KMT2AALDH1A1
SCHEMBL26037757 0.81 ALDH1A1 (0.50) SENP1MEN1KMT2AALDH1A1MAPT
SCHEMBL27713146 0.79 SENP1 (0.51) SENP1ESR1ESR2MEN1KMT2A
SCHEMBL21500822 0.79 SERPINE1 (0.51) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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