SCHEMBL21500897

SCHEMBL21500897

O=C(Oc1ccc(O)cc1)c1c(I)c(I)cc(I)c1I

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.38
▸ PCNA P12004 3/20 0.38
▸ MEN1 O00255 2/20 0.38
▸ KMT2A Q03164 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ ELANE P08246 2/20 0.38
▸ GAA P10253 2/20 0.37
▸ XBP1 P17861 1/20 0.37
▸ KDM4E B2RXH2 1/20 0.36
▸ GLA P06280 1/20 0.36
▸ THRB P10828 1/20 0.36
▸ BLM P54132 1/20 0.36
▸ CASP6 P55212 1/20 0.36
▸ GFER P55789 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ ESR1 P03372 1/20 0.35
▸ ESR2 Q92731 1/20 0.35
▸ NPC1 O15118 1/20 0.35
▸ CASP3 P42574 1/20 0.35
▸ RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500900 0.87 MAPT (0.41) MAPTMEN1KMT2ALMNAELANE
SCHEMBL21500892 0.86 MAPT (0.38) MAPTPCNAMEN1KMT2ALMNA
SCHEMBL21500833 0.81 ESR2 (0.39) MAPTPCNAMEN1KMT2ALMNA
SCHEMBL21500885 0.79 ELANE (0.50) MAPTMEN1KMT2ALMNAELANE
SCHEMBL21500896 0.79 MAPT (0.38) MAPTPCNAMEN1KMT2ALMNA
SCHEMBL21500839 0.78 MAPT (0.51) MAPTPCNAMEN1KMT2ALMNA
SCHEMBL21500825 0.78 ELANE (0.44) MAPTPCNAMEN1KMT2ALMNA
SCHEMBL21500884 0.77 ELANE (0.52) MAPTMEN1KMT2ALMNAELANE
SCHEMBL21500841 0.76 KMT2A (0.48) MAPTMEN1KMT2ATDP1ESR1
SCHEMBL21500874 0.74 KMT2A (0.40) MAPTMEN1KMT2AESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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