SCHEMBL21500825

SCHEMBL21500825

O=C(Oc1ccc(Cc2ccc(O)cc2)cc1)c1c(I)ccc(I)c1I

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.44
▸ ESR1 P03372 1/20 0.41
▸ ESR2 Q92731 1/20 0.41
▸ PTPN1 P18031 1/20 0.41
▸ APP P05067 1/20 0.38
▸ MAPT P10636 3/20 0.36
▸ NPC1 O15118 2/20 0.36
▸ RAB9A P51151 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ CASP3 P42574 1/20 0.36
▸ SENP8 Q96LD8 1/20 0.36
▸ SENP7 Q9BQF6 1/20 0.36
▸ SENP6 Q9GZR1 1/20 0.36
▸ PCNA P12004 3/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ TAAR5 O14804 1/20 0.34
▸ TAAR1 Q96RJ0 1/20 0.34
▸ LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500892 0.91 MAPT (0.38) ELANEESR1ESR2APPMAPT
SCHEMBL21500833 0.86 ESR2 (0.39) ELANEESR1ESR2MAPTPCNA
SCHEMBL21500885 0.84 ELANE (0.50) ELANEESR1ESR2MAPTRAB9A
SCHEMBL21500839 0.82 MAPT (0.51) ELANEMAPTPCNAMEN1KMT2A
SCHEMBL21500884 0.81 ELANE (0.52) ELANEMAPTMEN1KMT2ALMNA
SCHEMBL21500866 0.80 KIF11 (0.37) ELANEESR1ESR2MAPTMEN1
SCHEMBL21500856 0.80 ESR1 (0.44) ELANEESR1ESR2MAPTSMN1; SMN2
SCHEMBL21500917 0.78 KMT2A (0.56) ESR1ESR2APPNPC1RAB9A
SCHEMBL21500897 0.78 MAPT (0.38) ELANEESR1ESR2MAPTNPC1
SCHEMBL21500896 0.78 MAPT (0.38) ELANEESR1ESR2APPMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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