SCHEMBL21500833

SCHEMBL21500833

O=C(Oc1ccc(-c2ccc(O)cc2)cc1)c1c(I)ccc(I)c1I

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR2 Q92731 2/20 0.39
▸ SENP1 Q9P0U3 1/20 0.36
▸ ESR1 P03372 1/20 0.35
▸ MAPT P10636 4/20 0.35
▸ LMNA P02545 2/20 0.35
▸ MEN1 O00255 2/20 0.35
▸ KMT2A Q03164 2/20 0.35
▸ ELANE P08246 2/20 0.35
▸ KIF11 P52732 1/20 0.35
▸ HSD17B1 P14061 1/20 0.34
▸ KDM4E B2RXH2 2/20 0.34
▸ GAA P10253 2/20 0.34
▸ XBP1 P17861 1/20 0.34
▸ TDP1 Q9NUW8 3/20 0.33
▸ GFER P55789 2/20 0.33
▸ EGFR P00533 1/20 0.33
▸ GLA P06280 1/20 0.33
▸ THRB P10828 1/20 0.33
▸ BLM P54132 1/20 0.33
▸ CASP6 P55212 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500892 0.95 MAPT (0.38) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500885 0.88 ELANE (0.50) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500839 0.86 MAPT (0.51) MAPTLMNAMEN1KMT2AELANE
SCHEMBL21500825 0.86 ELANE (0.44) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500884 0.85 ELANE (0.52) MAPTLMNAMEN1KMT2AELANE
SCHEMBL21500886 0.84 ELANE (0.33) MAPTLMNAMEN1KMT2AELANE
SCHEMBL21500856 0.84 ESR1 (0.44) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500866 0.84 KIF11 (0.37) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500897 0.81 MAPT (0.38) ESR2ESR1MAPTLMNAMEN1
SCHEMBL21500896 0.81 MAPT (0.38) ESR2SENP1ESR1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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