SCHEMBL21500885

SCHEMBL21500885

O=C(c1ccc(O)cc1)c1ccc(OC(=O)c2c(I)ccc(I)c2I)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 9/20 0.50
▸ LMNA P02545 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ HTT P42858 2/20 0.46
▸ ESR1 P03372 1/20 0.46
▸ ESR2 Q92731 1/20 0.46
▸ PKM P14618 1/20 0.46
▸ HPGD P15428 1/20 0.46
▸ SRD5A2 P31213 1/20 0.41
▸ MAPK1 P28482 1/20 0.40
▸ MEN1 O00255 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ PARP10 Q53GL7 1/20 0.37
▸ CA12 O43570 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36
▸ CA7 P43166 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ CA14 Q9ULX7 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500892 0.92 MAPT (0.38) ELANELMNAMAPTHTTESR1
SCHEMBL21500833 0.88 ESR2 (0.39) ELANELMNAMAPTESR1ESR2
SCHEMBL21500825 0.84 ELANE (0.44) ELANELMNAMAPTESR1ESR2
SCHEMBL21500839 0.84 MAPT (0.51) ELANELMNAMAPTMEN1KMT2A
SCHEMBL21500884 0.82 ELANE (0.52) ELANELMNAMAPTPKMMEN1
SCHEMBL21500886 0.81 ELANE (0.33) ELANELMNAMAPTMEN1KMT2A
SCHEMBL21500856 0.81 ESR1 (0.44) ELANELMNAMAPTESR1ESR2
SCHEMBL21500866 0.81 KIF11 (0.37) ELANELMNAMAPTESR1ESR2
SCHEMBL21500897 0.79 MAPT (0.38) ELANELMNAMAPTESR1ESR2
SCHEMBL21500896 0.79 MAPT (0.38) ELANELMNAMAPTESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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