SCHEMBL2152579

SCHEMBL2152579

CCCCCCCCCCOCC(COC(=O)CCCCCCCCC)OCCCCCCCC

nearest known ligand 0.64

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 2/20 0.64
▸ ALDH1A1 P00352 1/20 0.64
▸ PRKCA P17252 3/20 0.59
▸ PRKCE Q02156 1/20 0.59
▸ PRKCQ Q04759 1/20 0.59
▸ PRKCD Q05655 1/20 0.59
▸ LPAR1 Q92633 4/20 0.57
▸ LPAR3 Q9UBY5 4/20 0.57
▸ MAPT P10636 1/20 0.57
▸ DGKA P23743 1/20 0.56
▸ KDM4E B2RXH2 1/20 0.54
▸ DUSP3 P51452 1/20 0.54
▸ MEN1 O00255 1/20 0.54
▸ KMT2A Q03164 1/20 0.54
▸ LPAR2 Q9HBW0 1/20 0.54
▸ ENPP2 Q13822 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2152312 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL2152798 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL6018541 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL2152823 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL2152572 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL2152561 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL18106999 1.00 LMNA (0.64) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL3937050 0.95 LMNA (0.70) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL10520413 0.94 ALDH1A1 (0.57) LMNAALDH1A1PRKCAPRKCEPRKCQ
SCHEMBL9814037 0.94 ALDH1A1 (0.57) LMNAALDH1A1PRKCAPRKCEPRKCQ

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11306216-B2 High molecular weight polystyrene in inks and coatings SUN CHEMICAL CORPORATION (US) 2022-04-19 — — US disclosed
US-20200317939-A1 HIGH MOLECULAR WEIGHT POLYSTYRENE IN INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2020-10-08 — — US disclosed
US-9546290-B2 Sheet-fed offset printing inks and varnishes comprising new solvents SUN CHEMICAL CORPORATION (US) 2017-01-17 — — US disclosed
US-20140128524-A1 SHEET-FED OFFSET PRINTING INKS AND VARNISHES COMPRISING NEW SOLVENTS SUN CHEMICAL CORP (US) 2014-05-08 — — US disclosed
US-8657945-B2 Sheet-fed offset printing inks and varnishes comprising new solvents SUN CHEMICAL CORPORATION (US) 2014-02-25 — — US disclosed
US-20120167798-A1 SHEET-FED OFFSET PRINTING INKS AND VARNISHES COMPRISING NEW SOLVENTS PULINA TILLMANN (DE) 2012-07-05 — — US disclosed
US-8168708-B2 Sheet-fed offset printing inks and varnishes comprising new solvents SUN CHEMICAL CORPORATION (US) 2012-05-01 — — US disclosed
EP-2054480-B1 SHEET-FED OFFSET PRINTING INKS AND VARNISHES COMPRISING NEW SOLVENTS SUN CHEMICAL CORP (US) 2011-07-06 — — EP disclosed
US-20100174020-A1 Sheet-Fed Offset Printing Inks and Varnishes Comprising New Solvents SUN CHEMICAL CORPORATION (US) 2010-07-08 — — US disclosed
EP-2177578-A1 Sheet-fed offset printing inks and varnishes comprising new solvents Sun Chemical Corporation (US) 2010-04-21 — — EP disclosed
EP-2177579-A1 Sheet-fed offset printing inks and varnishes comprising new solvents Sun Chemical Corporation (US) 2010-04-21 — — EP disclosed
EP-2054480-A1 SHEET-FED OFFSET PRINTING INKS AND VARNISHES COMPRISING NEW SOLVENTS Sun Chemical Corporation (US) 2009-05-06 — — EP disclosed
WO-2008024968-A1 SHEET-FED OFFSET PRINTING INKS AND VARNISHES COMPRISING NEW SOLVENTS SUN CHEMICAL CORPORATION (US) 2008-02-28 — — WO disclosed
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