SCHEMBL215676

SCHEMBL215676

C=Cc1ccc2cccc(Cl)c2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 3/20 0.48
CYP1A2 P05177 2/20 0.48
TP53 P04637 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
TYMS P04818 1/20 0.38
ALDH1A1 P00352 4/20 0.38
ADRA2A P08913 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TSHR P16473 1/20 0.33
ABCG2 Q9UNQ0 2/20 0.33
TRPV1 Q8NER1 1/20 0.33
NR4A2 P43354 1/20 0.32
MAPT P10636 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
DAO P14920 1/20 0.32
CA12 O43570 1/20 0.32
CA9 Q16790 1/20 0.32
PTGES O14684 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL216389 0.85 CYP1A2 (0.48) CYP2A6CYP1A2TP53TDP1ALDH1A1
SCHEMBL4102305 0.81 ALDH1A1 (0.50) CYP2A6CYP1A2TDP1ALDH1A1MEN1
SCHEMBL2443320 0.78 TYMS (0.42) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL29760312 0.78 TYMS (0.42) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL1778036 0.78 ALDH1A1 (0.56) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL38666753 0.78 ALDH1A1 (0.56) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL21244259 0.77 CYP1A2 (0.57) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL11963906 0.77 CTDSP1 (0.53) CYP1A2TP53TDP1TYMSALDH1A1
SCHEMBL216923 0.77 TDP1 (0.39) CYP2A6CYP1A2TP53TDP1TYMS
SCHEMBL214543 0.77 TDP1 (0.39) CYP2A6CYP1A2TP53TDP1TYMS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780600-B1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM NISSAN CHEMICAL IND LTD (JP) 2014-02-26 EP disclosed
US-8088546-B2 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-01-03 US disclosed
CN-1977220-B Lower layer film forming composition for lithography including naphthalene ring having halogen atom NISSAN CHEMICAL IND LTD 2010-12-01 CN disclosed
US-20070238029-A1 Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-11 US disclosed
EP-1780600-A1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM Nissan Chemical Industries, Ltd. (JP) 2007-05-02 EP disclosed