SCHEMBL2157174

SCHEMBL2157174

C=C(C)C(=O)OCCc1ccc(C(=O)O)c(C(=O)O)c1CCO

nearest known ligand 0.40

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
THRB P10828 1/20 0.37
TSHR P16473 2/20 0.33
CA1 P00915 3/20 0.32
CA2 P00918 3/20 0.32
PTPN1 P18031 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3861873 0.95 POLB (0.40) POLBAPEX1HTTTDP1THRB
SCHEMBL2237265 0.94 POLB (0.42) POLBAPEX1HTTTDP1THRB
SCHEMBL8144161 0.86 POLB (0.46) POLBAPEX1HTTTDP1THRB
SCHEMBL815210 0.84 POLB (0.38) POLBAPEX1HTTTDP1THRB
SCHEMBL27383301 0.84 POLB (0.45) POLBAPEX1HTTTDP1THRB
SCHEMBL1269728 0.84 POLB (0.45) POLBAPEX1HTTTDP1THRB
SCHEMBL11341100 0.84 POLB (0.50) POLBAPEX1HTTTDP1THRB
SCHEMBL8144939 0.83 POLB (0.42) POLBAPEX1HTTTDP1THRB
SCHEMBL815209 0.82 POLB (0.38) POLBAPEX1HTTTDP1THRB
SCHEMBL10884576 0.81 THRB (0.40) POLBAPEX1HTTTDP1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4558571-B1 A CURABLE INKJET COMPOSITION FOR THE MANUFACTURING OF PRINTED CIRCUIT BOARDS AGFA GEVAERT NV (BE) 2026-04-08 EP disclosed
US-20260028493-A1 A Curable Inkjet Composition for the Manufacturing of Printed Circuit Boards AGFA-GEVAERT NV (BE) 2026-01-29 US disclosed
CN-119744288-A Curable inkjet composition for manufacturing printed circuit boards 爱克发-格法特公司 2025-04-01 CN disclosed
WO-2024017864-A1 A CURABLE INKJET COMPOSITION FOR THE MANUFACTURING OF PRINTED CIRCUIT BOARDS AGFA-GEVAERT NV (BE) 2024-01-25 WO disclosed
CN-106463709-B Composite particles for electrochemical element electrode and its manufacturing method, electro-chemical element electrode and its manufacturing method and electrochemical element 日本瑞翁株式会社 2019-11-26 CN disclosed
CN-107532302-B Photonasty electroless plating substrate agent 日产化学工业株式会社 2019-10-08 CN disclosed
CN-109843935-A Dispersion liquid 住友化学株式会社 2019-06-04 CN disclosed
CN-106459241-B Water-based emulsion and film, solidfied material and laminated body 住友化学株式会社 2019-03-01 CN disclosed
CN-104228382-B Image forming method, decoration sheet, forming and machining method, decoration sheet molding, the manufacture method of mould internal shaping product and mould internal shaping product 富士胶片株式会社 2018-05-01 CN disclosed
CN-103666105-B Composition for ink jet recording, ink jet recording method and printed article 富士胶片株式会社 2018-04-27 CN disclosed
CN-102421580-A Transfer sheet and method for manufacturing the same DAIKIN IND LTD 2012-04-18 CN disclosed
US-7972535-B2 Composite particles for electrochemical device electrode, method of production of composite particles for electrochemical device electrode, and electrochemical device electrode ZEON CORPORATION (JP) 2011-07-05 US disclosed
US-20090267028-A1 Composite Particles for Electrochemical Device Electrode, Method of Production of Composite Particles for Electrochemica Device Electrode, and Electrochemical Device Electrode ZEON CORPORATION (JP) 2009-10-29 US disclosed
US-7598014-B2 Thick film photoresist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-06 US disclosed
US-20080096109-A1 Composition For Electrode, Electrode And Battery ZEON CORPORATION (JP) 2008-04-24 US disclosed
US-20070105037-A1 Thick film photoresist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-05-10 US disclosed
WO-2005054951-A2 THICK FILM PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2005-06-16 WO disclosed
US-5908899-A RUBBER-MODIFIED UNSATURATED COMPOUND OBTAINED BY GRAFTING A MONOMER HAVING AT LEAST ONE POLYMERIZABLE ETHYLENICALLY UNSATURATED BOND IN A MOLECULE WITH AT LEAST ONE RUBBER; A COUPLING AGENT, A FILLER AND A PHOTOPOLYMERIZATION INITIATOR. MITSUI CHEMICALS, INC. (JP) 1999-06-01 US disclosed
US-5691092-A FORMING LIQUID CRYSTALLINE POLYMER ON SUBSTRATE; PROTECTIVE LAYER; HEATING; CROSSLINKING FUJI XEROX CO., LTD. (JP) 1997-11-25 US disclosed
EP-0781809-A2 Resin composition for sealing liquid crystal cells MITSUI TOATSU CHEMICALS, INC. (JP) 1997-07-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260028493-A1 A Curable Inkjet Composition for the Manufacturing of Printed Circuit Boards KDM5A, CRBN, KDM5C POLB 1759/4885APEX1 1736/4885HTT 3026/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.