SCHEMBL21574538

SCHEMBL21574538

CCCC(C)(CC)C(=O)OCCOC(=O)C(F)(F)S

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26188272 0.86 LMNA (0.34) LMNAHSD17B10
SCHEMBL17617113 0.82 LMNA (0.38) LMNAHSD17B10
SCHEMBL21574546 0.81 CYP4F2 (0.30) —
SCHEMBL21574535 0.80 — —
SCHEMBL16705256 0.80 ALDH1A1 (0.32) LMNAHSD17B10
SCHEMBL15295457 0.79 ALDH1A1 (0.47) LMNAHSD17B10
SCHEMBL21214509 0.77 HTT (0.39) LMNAHSD17B10
SCHEMBL21574537 0.77 CES2 (0.31) —
SCHEMBL17617205 0.76 CYP4F2 (0.44) LMNAHSD17B10
SCHEMBL17617167 0.76 CYP4F2 (0.44) LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2492746-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2019-11-20 — — EP disclosed
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