SCHEMBL2160485

SCHEMBL2160485

CC(=Cc1ccccc1C)c1ccccc1Oc1ccccc1C(C)=Cc1ccccc1C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.38
TSHR P16473 3/20 0.38
MAPT P10636 4/20 0.38
KDM4E B2RXH2 3/20 0.38
DHFR P00374 2/20 0.38
KDR P35968 2/20 0.38
PDGFRB P09619 1/20 0.38
HTT P42858 2/20 0.38
LMNA P02545 3/20 0.36
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
HPGD P15428 3/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
PLIN1 O60240 1/20 0.36
POLB P06746 1/20 0.36
PLIN5 Q00G26 1/20 0.36
ABHD5 Q8WTS1 1/20 0.36
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6546613 0.83 ALDH1A1 (0.45) ALDH1A1TSHRKDM4EHTTLMNA
SCHEMBL6546986 0.75 ALDH1A1 (0.41) ALDH1A1TSHRMAPTKDM4EHTT
SCHEMBL22597894 0.74 ALDH1A1 (0.46) ALDH1A1TSHRMAPTKDM4EHTT
SCHEMBL6546762 0.72 NFE2L2 (0.43) ALDH1A1TSHRMAPTKDM4EHTT
SCHEMBL25622621 0.72 TSHR (0.45) ALDH1A1TSHRMAPTKDM4EHPGD
SCHEMBL842429 0.72 TSHR (0.45) ALDH1A1TSHRMAPTKDM4EHPGD
SCHEMBL19821092 0.71 RAB9A (0.44) ALDH1A1TSHRMAPTKDM4EHTT
SCHEMBL257719 0.71 ALDH1A1 (0.52) ALDH1A1TSHRMAPTKDM4EHTT
SCHEMBL9495614 0.70 CHRNA7 (0.44) ALDH1A1TSHRMEN1KMT2AL3MBTL1
SCHEMBL20959772 0.69 MEN1 (0.46) ALDH1A1TSHRMAPTKDM4EHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8703007-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2014-04-22 US disclosed
US-20110180511-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2011-07-28 US disclosed