Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.33 |
| ▸ | RXRA | P19793 | 1/20 | 0.33 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.33 |
| ▸ | RXRB | P28702 | 1/20 | 0.33 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.33 |
| ▸ | RXRG | P48443 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL216309 | 1.00 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL18269630 | 1.00 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL2720170 | 0.94 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL261261 | 0.94 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL4309465 | 0.88 | ALDH1A1 (0.36) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL1394143 | 0.88 | ALDH1A1 (0.36) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL19510386 | 0.87 | — | — | |
| SCHEMBL388743 | 0.84 | SLC6A3 (0.31) | SLC6A3 | |
| SCHEMBL23923025 | 0.81 | CD81 (0.33) | ALDH1A1 | |
| SCHEMBL28342199 | 0.81 | SLC6A3 (0.35) | SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250206862-A1 | CAVITY FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20250136734-A1 | PROTECTIVE-FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-01 | — | — | US | disclosed |
| WO-2023157772-A1 | PROTECTIVE FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| EP-1780600-B1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | NISSAN CHEMICAL IND LTD (JP) | 2014-02-26 | — | — | EP | disclosed |
| US-8481247-B2 | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL INDUSTRIES, LTD. | 2013-07-09 | — | — | US | disclosed |
| US-8088546-B2 | Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20080102649-A1 | Underlayer Coating Forming Composition For Lythography Containing Compound Having Protected Carboxyl Group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-01 | — | — | US | disclosed |
| EP-1850180-A1 | COMPOSITION FOR FORMING OF UNDERLAYER FILM FOR LITHOGRAPHY THAT CONTAINS COMPOUND HAVING PROTECTED CARBOXYL | Nissan Chemical Industries, Ltd. (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-20070238029-A1 | Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| EP-1780600-A1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |