SCHEMBL21634166

SCHEMBL21634166

CCO[Si](CCCCCCn1cnc(N)n1)(OCC)OCC

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KDR P35968 5/20 0.37
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
EP300 Q09472 3/20 0.32
MAPT P10636 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21634158 0.85 KDR (0.33) KDRALDH1A1MAPTHTT
SCHEMBL21634171 0.85 KDR (0.33) KDRALDH1A1MAPTHTT
SCHEMBL22588245 0.79 KDR (0.50) KDRALDH1A1MAPTHTT
SCHEMBL21670581 0.78 KMT2A (0.34) ALDH1A1LMNA
SCHEMBL21634161 0.78 KDR (0.36) KDR
SCHEMBL29558047 0.78 ALDH1A1 (0.35) ALDH1A1LMNAMAPTHTT
SCHEMBL23071439 0.77 KDR (0.36) KDRALDH1A1LMNAMAPTHTT
SCHEMBL26111954 0.77
SCHEMBL23071446 0.73 SMPD1 (0.39) KDREP300
SCHEMBL23071430 0.73 SMPD1 (0.39) KDREP300

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250331107-A1 ORGANIC FILM AND METHOD FOR PRODUCING SAME SHIKOKU CHEM (JP) 2025-10-23 US disclosed
US-20250263580-A1 METAL SURFACE TREATMENT LIQUID SHIKOKU CHEMICALS CORPORATION (JP) 2025-08-21 US disclosed
EP-4459006-A1 SURFACE TREATMENT LIQUID FOR METAL SHIKOKU CHEMICALS CORPORATION (JP) 2024-11-06 EP disclosed
EP-4459007-A1 ORGANIC COATING AND METHOD FOR PRODUCING SAME SHIKOKU CHEMICALS CORPORATION (JP) 2024-11-06 EP disclosed
US-12091430-B2 Metal surface treatment liquid and liquid concentrate thereof, metal surface treatment liquid set, metal surface treatment method, and method for manufacturing printed wiring board SHIKOKU CHEMICALS CORPORATION (JP) 2024-09-17 US disclosed
CN-118475721-A Surface treatment liquid for metal 四国化成工业株式会社 2024-08-09 CN disclosed
CN-118414453-A Organic coating and method for producing same 四国化成工业株式会社 2024-07-30 CN disclosed
CN-114341401-B Surface treatment liquid for metal, concentrated liquid thereof, surface treatment liquid set for metal, surface treatment method, and method for producing printed wiring board 四国化成工业株式会社 2024-04-05 CN disclosed
WO-2023127679-A1 SURFACE TREATMENT LIQUID FOR METAL 四国化成工業株式会社 2023-07-06 WO disclosed
WO-2023127681-A1 ORGANIC COATING AND METHOD FOR PRODUCING SAME 四国化成工業株式会社 2023-07-06 WO disclosed
US-11680076-B2 Triazole silane compound, method for synthesizing said compound and use thereof SHIKOKU CHEMICALS CORPORATION (JP) 2023-06-20 US disclosed
US-20220306656-A1 METAL SURFACE TREATMENT LIQUID AND LIQUID CONCENTRATE THEREOF, METAL SURFACE TREATMENT LIQUID SET, METAL SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD SHIKOKU CHEMICALS CORPORATION (JP) 2022-09-29 US disclosed
EP-4026931-A1 METAL SURFACE TREATMENT SOLUTION AND LIQUID CONCENTRATE THEREOF, METAL SURFACE TREATMENT SOLUTION SET, METAL SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD Shikoku Chemicals Corporation (JP) 2022-07-13 EP disclosed
CN-110475782-B Triazole silane compound, method for synthesizing the compound, and use thereof 四国化成工业株式会社 2022-05-17 CN disclosed
EP-3608327-B1 TRIAZOLE SILANE COMPOUND, METHOD FOR SYNTHESIZING SAID COMPOUND AND USE THEREOF SHIKOKU CHEM (JP) 2022-05-04 EP disclosed
CN-114341401-A Metal surface treatment liquid and concentrated liquid thereof, metal surface treatment liquid set and surface treatment method, and printed wiring board manufacturing method 四国化成工业株式会社 2022-04-12 CN disclosed
WO-2021045055-A1 METAL SURFACE TREATMENT SOLUTION AND LIQUID CONCENTRATE THEREOF, METAL SURFACE TREATMENT SOLUTION SET, METAL SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD 四国化成工業株式会社 2021-03-11 WO disclosed
EP-3608327-A1 TRIAZOLE SILANE COMPOUND, METHOD FOR SYNTHESIZING SAID COMPOUND AND USE THEREOF Shikoku Chemicals Corporation (JP) 2020-02-12 EP disclosed
US-20200031852-A1 TRIAZOLE SILANE COMPOUND, METHOD FOR SYNTHESIZING SAID COMPOUND AND USE THEREOF SHIKOKU CHEMICALS CORPORATION (JP) 2020-01-30 US disclosed
CN-110475782-A The synthetic method and its utilization of triazole silane compound, the compound SHIKOKU CHEM 2019-11-19 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11680076-B2 Triazole silane compound, method for synthesizing said compound and use thereof CYP51A1, TLK2, SIK2 KDR 3390/4885ALDH1A1 1995/4885LMNA 3218/4885
US-12091430-B2 Metal surface treatment liquid and liquid concentrate thereof, metal surface treatment liquid set, metal surface treatment method, and method for manufacturing printed wiring board WIZ, CA1, CA3 KDR 1715/4885ALDH1A1 1086/4885LMNA 1904/4885
US-20200031852-A1 TRIAZOLE SILANE COMPOUND, METHOD FOR SYNTHESIZING SAID COMPOUND AND USE THEREOF SEPTIN8, SIK2, CYP51A1 KDR 3670/4885ALDH1A1 1887/4885LMNA 3722/4885
US-20220306656-A1 METAL SURFACE TREATMENT LIQUID AND LIQUID CONCENTRATE THEREOF, METAL SURFACE TREATMENT LIQUID SET, METAL SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD WIZ, CA1, CA3 KDR 1715/4885ALDH1A1 1086/4885LMNA 1904/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.