SCHEMBL21644746

SCHEMBL21644746

Br[Mg]Br.[CH2]c1ccc2ccccc2c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 7/20 0.46
CYP1A2 P05177 5/20 0.41
ALDH1A1 P00352 4/20 0.41
CYP3A4 P08684 4/20 0.41
HSD17B10 Q99714 4/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
ALOX12 P18054 2/20 0.38
CES2 O00748 1/20 0.37
CES1 P23141 1/20 0.37
HPGD P15428 2/20 0.35
GSTP1 P09211 1/20 0.35
RELA Q04206 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
HIF1A Q16665 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36452 0.90 CYP2A6 (0.48) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL27838385 0.87 CYP2A6 (0.46) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL27905829 0.87 CYP2A6 (0.46) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL27922290 0.86 CYP2A6 (0.46) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL536732 0.82 ALDH1A1 (0.50) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL2463315 0.82 ALDH1A1 (0.50) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL1178667 0.79 CYP2A6 (0.37) CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10
SCHEMBL7409541 0.71 ESR1 (0.61) CYP1A2ALDH1A1CA1CA2CA9
SCHEMBL1971137 0.71 ALDH1A1 (0.61) CYP2A6CYP1A2ALDH1A1HSD17B10TDP1
SCHEMBL15351596 0.70 CYP2A6 (0.56) CYP2A6CYP1A2ALDH1A1TDP1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200041901-A1 SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2020-02-06 US disclosed
CN-107108871-B The manufacturing method of polyester 日本曹达株式会社 2019-04-30 CN disclosed
CN-107108871-A The manufacture method of polyester 日本曹达株式会社 2017-08-29 CN disclosed