Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.38 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.38 |
| ▸ | KIF11 | P52732 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.32 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29851795 | 1.00 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Hydrochloric Acid SCHEMBL6262076 | 0.97 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Water SCHEMBL107595 | 0.97 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Iodide SCHEMBL2968442 | 0.97 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL29730022 | 0.91 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL9312855 | 0.91 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Perflubutane SCHEMBL5665288 | 0.87 | ALDH1A1 (0.39) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL7908278 | 0.85 | ALDH1A1 (0.38) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Sulfuric Acid SCHEMBL8628602 | 0.85 | ALDH1A1 (0.38) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Acetic Acid SCHEMBL2518531 | 0.85 | ALDH1A1 (0.42) | ALDH1A1TDP1TSHRCA2GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 306 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8986918-B2 | Hybrid photoresist composition and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-03-24 | — | — | US | claimed |
| US-8932796-B2 | Hybrid photoresist composition and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-01-13 | — | — | US | claimed |
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | claimed |
| US-7651831-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-01-26 | — | — | US | claimed |
| WO-2009051920-A1 | RADIATION-SENSITIVE, WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND THEIR APPLICATIONS IN SEMICONDUCTOR MANUFACTURING | JSR MICRO, INC. (US) | 2009-04-23 | — | — | WO | claimed |
| US-20090098490-A1 | Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing | JSR MICRO, INC. | 2009-04-16 | — | — | US | claimed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | claimed |
| EP-1664923-A4 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | IBM (US) | 2008-08-27 | — | — | EP | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | claimed |
| EP-0990625-B1 | Vinyl ether-based optical fiber coatings | LUCENT TECHNOLOGIES INC (US) | 2003-12-10 | — | — | EP | claimed |
| US-6653045-B2 | Negative resist containing a polysilsesquioxane polymer with pendant fused rings and sites for reaction with a crosslinking agent, an acid-sensitive glycolurils ascrosslinking agent, and a radiation sensitive generator | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-11-25 | — | — | US | claimed |
| WO-2003058347-A1 | NEGATIVE DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129527-A1 | Negative deep ultraviolet photoresist | AZ ELECTRONIC MATERIALS USA CORP. | 2003-07-10 | — | — | US | claimed |
| US-20020115017-A1 | Radiation sensitive silicon-containing negative resists and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-08-22 | — | — | US | claimed |
| US-6344305-B1 | AMPLIFIED SILICON-CONTAINING NEGATIVE-TONE RESIST COMPOSITION OF AQUEOUS BASE SOLUBLE SILICON-CONTAINING POLYMER HAVING PHENOLIC GROUP FOR O-ALKYLATION; ACID CATALYZABLE CROSSLINKING AGENT; ACID GENERATOR; SOLVENT; PHOTOSENSITIZER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-02-05 | — | — | US | claimed |
| US-6187505-B1 | MIXTURE COMPRISING POLYSILSESQUIOXANE HAVING PHENOLIC GROUPS CROSSLINKABLE WITH ACID CATALYZABLE CURING AGENT, ACID GENERATOR, PHOTOSENSITIZER, A BASE AND SURFACTANT; PATTERN RESOLUTION WITH HIGH ASPECT RATIO | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | claimed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | claimed |