Sulfuric Acid

Sulfuric Acid

SCHEMBL8628602

CC(C)(C)c1ccccc1[I+]c1ccccc1C(C)(C)C.O=S(=O)([O-])[O-].[H+]

nearest known ligand 0.38

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Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
TSHR P16473 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HSD11B1 P28845 5/20 0.36
CA2 P00918 1/20 0.34
RBP4 P02753 2/20 0.34
PTGS2 P35354 3/20 0.33
NR1I2 O75469 1/20 0.31
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7908278 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1HSD11B1CA2
Sulfuric Acid SCHEMBL8628604 0.91 TDP1 (0.41) ALDH1A1TSHRTDP1HSD11B1CA2
Trifluoromethanesulfonic Acid SCHEMBL59634 0.87 HSD11B1 (0.43) ALDH1A1TSHRTDP1HSD11B1
Trifluoromethanesulfonic Acid SCHEMBL29851847 0.87 HSD11B1 (0.43) ALDH1A1TSHRTDP1HSD11B1
SCHEMBL2634677 0.86 HSD11B1 (0.36) ALDH1A1TSHRTDP1HSD11B1RBP4
SCHEMBL9617862 0.86 HSD11B1 (0.36) ALDH1A1TSHRTDP1HSD11B1CA2
SCHEMBL31582661 0.86 HSD11B1 (0.36) ALDH1A1TSHRTDP1HSD11B1RBP4
SCHEMBL216497 0.85 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2RBP4
SCHEMBL29851795 0.85 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2RBP4
Hydrochloric Acid SCHEMBL6262076 0.83 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CA2RBP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0848288-A1 Resist materials LUCENT TECHNOLOGIES INC. (US) 1998-06-17 EP disclosed