Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 known ✓ | P14867 | 1/20 | 0.37 |
| ▸ | GABRB2 known ✓ | P47870 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | KIF11 | P52732 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.31 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.31 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.31 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.31 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.31 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.31 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL216497 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL29851795 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Hydrochloric Acid SCHEMBL6262076 | 0.95 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Iodide SCHEMBL2968442 | 0.95 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL9312855 | 0.89 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL29730022 | 0.89 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Perflubutane SCHEMBL5665288 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Sulfuric Acid SCHEMBL8628602 | 0.83 | ALDH1A1 (0.38) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL7908278 | 0.83 | ALDH1A1 (0.38) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Acetic Acid SCHEMBL2518531 | 0.83 | ALDH1A1 (0.42) | ALDH1A1TDP1TSHRCA2GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 974 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12578648-B2 | Rinsing liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-3435158-B1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250321486-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250271765-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| EP-4597225-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20030077540-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| EP-1300727-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-20030044717-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-20030017415-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-01-23 | — | — | US | disclosed |
| US-20030010748-A1 | Positive photosensitive compositions | FUJI PHOTO FILM CO., LTD. | 2003-01-16 | — | — | US | disclosed |
| EP-1273970-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |
| EP-1260864-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-27 | — | — | EP | disclosed |
| EP-0677788-B1 | Radiation-sensitive mixture | CLARIANT FINANCE BVI LTD (VG) | 2000-06-21 | — | — | EP | disclosed |
| US-5663035-A | PHOTOSENSITIVE ACID GENERATORS, PHOTORESISTS, CONTROLLING ACID DIFFUSION WITH IODONIUM COMPOUND | HOECHST JAPAN LIMITED (JP) | 1997-09-02 | — | — | US | disclosed |
| EP-0677788-A1 | Radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1995-10-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12578648-B2 | Rinsing liquid and pattern forming method | ALKBH5, GABBR1, DNMT3B | GABRA1 56/4885GABRB2 8/4885ALDH1A1 1071/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.